Electrolytic process for depositing a graduated layer on a substrate, and component

Abstract

This invention relates to an electrolytic process for the deposition of a graduated layer on a substrate. The process includes depositing a composite material having a first constituent and a second constituent forming a graduated layer on a substrate, introducing the substrate into an electrolyte for a period of time, varying the fist and second constituents of the electrolyte during the period of time to achieve the graduated layer, and using a current/voltage pulse for the electrolytic deposition such that an optimized deposition of the constituents occurs.

1 - 22 . (canceled)  
     
     
         23 . An electrolytic process for depositing a composite material on a substrate, comprising: 
 introducing the substrate into an electrolyte containing a first constituent;    electrolytically depositing the first constituent on the substrate to create a first layer;    introducing a second constituent into the electrolyte;    electrolytically depositing the second constituent on the first layer to create a second layer;    varying a concentration of the fist and second constituents of the electrolyte to achieve a graduated layer; and    using a current/voltage pulse to cause the electrolytic deposition such that an optimized deposition of the constituents occurs.    
     
     
         24 . The process as claimed in  claim 23 , wherein the substrate is arranged in a vessel filled with the electrolyte and the variation in the composition of the electrolyte during the period of time is effected by feeding the constituents into the vessel.  
     
     
         25 . The process as claimed in  claim 23 , wherein the substrate is arranged in the vessel and the variation in the composition of the electrolyte during the period of time is effected by the electrolyte comprising the first constituent such that the first constituent is partially removed and the second constituent being supplied.  
     
     
         26 . The process as claimed in  claim 23 , wherein the first constituent is metallic.  
     
     
         27 . The process as claimed in  claim 23 , wherein the first constituent is an alloy.  
     
     
         28 . The process as claimed in  claim 23 , wherein in the first constituent is a ceramic.  
     
     
         29 . The process as claimed in  claim 23 , wherein the second constituent is a ceramic.  
     
     
         30 . The process as claimed in  claim 23 , wherein the second constituent is metallic.  
     
     
         31 . The process as claimed in  claim 23 , wherein the electrolyte is mechanically vibrated by an ultrasound probe.  
     
     
         32 . The process as claimed in  claim 23 , wherein the current/voltage pulse and a time profile are used for the electrolytic deposition.  
     
     
         33 . The process as claimed in  claim 23 , wherein positive and negative current/voltage pulses are used for the electrolytic deposition.  
     
     
         34 . The process as claimed in  claim 23 , wherein a plurality of current/voltage pulses are combined in a sequence and are used for the electrolytic deposition.  
     
     
         35 . The process as claimed in  claim 34 , wherein the sequence comprises different blocks and a block comprises a plurality of current pulses.  
     
     
         36 . The process as claimed in  claim 35 , wherein the block is defined by a number of current pulses, a pulse duration, a pulse interval, a current level, and a time profile.  
     
     
         37 . The process as claimed in  claim 35 , wherein the block is matched to the first or second constituent of the alloy to optimize the deposition of the constituent.  
     
     
         38 . The process as claimed in  claim 35 , wherein the block is matched to the first or second constituent of the alloy to achieve the optimum composition of the constituents.  
     
     
         39 . The process as claimed in  claim 23 , wherein the layer deposited on the substrate is an MCrA 1 /X alloy, where M is an element selected from the group consisting of iron, cobalt or nickel, and X is yttrium, or at least one rare earth element.  
     
     
         40 . The process as claimed in  claim 38 , wherein an alloy layer that is produced and gradients in the material composition are influenced by a variation in the current/voltage pulse or the sequence during the period of time.  
     
     
         41 . The process as claimed in  claim 23 , wherein a base current is superimposed on the current pulses and the intervals.  
     
     
         42 . The process as claimed in  claim 23 , wherein a base current is superimposed on the current pulses or the intervals.  
     
     
         43 . The process as claimed in  claim 23 , wherein the substrate is a component of a steam turbine or a gas turbine.  
     
     
         44 . The process as claimed in  claim 43 , wherein the substrate is a component having no service history or a refurbished component.  
     
     
         45 . The process as claimed in  claim 23 , wherein the current/voltage pulse to cause the electrolytic deposition creates an optimized deposition of the constituents occurs.  
     
     
         46 . A coated turbine component, comprising: 
 a substrate;    a first layer comprised of a first constituent electrolytically deposited on the substrate;    a second layer comprised of a second constituent electrolytically deposited on the first layer; and    a graduated layer between the first and second layer produced by varying the concentration of the first and second constituent with the largest concentration of the first constituent toward the substrate and the largest concentration of the second constituent toward the second layer.    
     
     
         47 . The component as claimed in  claim 46 , wherein a first graduated layer of a first material is applied to the substrate and a second graduated layer is applied to the first graduated layer, the concentration of the first material decreasing in the layer starting from the substrate.  
     
     
         48 . The component as claimed in  claim 46 , wherein the concentration of the substrate in the first graduated layer decreases and the concentration of the first material in the first graduated layer increases.