Photosensitive material for non-substrate liquid crystal display

Abstract

The present invention provides a photosensitive material for non-substrate liquid crystal display. This photosensitive material includes photo-initiator selected from the free-radical type or cation type photo-initiator or mixture thereof, photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof, and modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof. The photosensitive material can surround liquid crystal display cell and separate from assisting substrates that a non-substrate liquid crystal cell surrounded by photosensitive material is acquired.

1 . A photosensitive material for non-substrate liquid crystal display having a composition comprising: 
 photo-initiator selected from the group consisting of diethoxy acetophenone, benzophenone, benzyl benzoin isobutyl ether, benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethyl thioxanthone, 2-ethyl anthraquinone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1-one), (2-methyl-[4-(methylthio)phenyl]2-morpholino-1-propane), aromatic diazonium salts, triallysulfonium salts, diallyiodonium salts, triallylselenium salts of Lewis acid as well as metallocene compounds and mixtures thereof;    photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof; and    modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof;    wherein said photosensitive material can surround the liquid crystal display cell after polymerization and curing that a non-substrate liquid crystal display cell surrounded by photosensitive material is acquired.    
     
     
         2 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein said photo-initiator comprises 2,2-diethoxyacetophenone or benzophenone.  
     
     
         3 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein said photosensitive polymerizable monomer comprises polyurethane type acrylate, acrylic monomer, epoxy compound, urethane acrylates, acrylic acrylates, epoxy acrylates, polyester acrylates  
     
     
         4 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein said modifier comprises siloxane, fluorinated ether or alcohol.  
     
     
         5 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein the mixing ratio of photo-initiator, photosensitive polymerizable monomers or oligomers, and modifier is 0.1-15 wt % photo-initiator, 10-99 wt % photosensitive polymerizable monomers or oligomers, and 0-5 wt % modifier.  
     
     
         6 . The photosensitive material for non-substrate liquid crystal display according to  claim 5 , wherein the mixing ratio of photo-initiator, photosensitive polymerizable monomers or oligomers, and modifier by weight is 2:96:2.  
     
     
         7 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein said photosensitive material is polymerized and cured under the irradiation of 350-380 nm ultraviolet light or high-pressure mercury lamp.  
     
     
         8 . The photosensitive material for non-substrate liquid crystal display according to  claim 7 , wherein said photosensitive material is polymerized and cured with 365 nm ultraviolet light.  
     
     
         9 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein said photosensitive material is further mixed with liquid crystal material.  
     
     
         10 . The photosensitive material for non-substrate liquid crystal display according to  claim 1 , wherein said photosensitive material is further mixed with nanometer particles.  
     
     
         11 . A photosensitive material for non-substrate liquid crystal display having a composition comprising: 
 0.1-15 wt % photo-initiator selected from the group consisting of diethoxy acetophenone, benzophenone, benzyl benzoin isobutyl ether, benzyl dimethyl ketal, 1-hydroxycyclohexyl phenyl ketone, diethyl thioxanthone, 2-ethyl anthraquinone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropane-1-one), (2-methyl-[4-(methylthio)phenyl]2-morphoholino-1-propane), aromatic diazonium salts, triallysulfonium salts, diallyiodonium salts, triallylselenium salts of Lewis acid as well as metallocene compounds and mixtures thereof;    10-99 wt % photosensitive polymerizable monomers or oligomers selected from the group consisting of double-bond compounds, compounds having epoxy functional group and mixtures thereof; and    0-5 wt % modifier selected from the group consisting of long-alkyl-chain functional group, silicone-alkyl compounds, double-bond compounds and mixtures thereof;    wherein said photosensitive material can surround liquid crystal display cell after curing that a non-substrate liquid crystal display cell surrounded by photosensitive material is acquired.    
     
     
         12 . The photosensitive material for non-substrate liquid crystal display according to  claim 11 , wherein said photo-initiator comprises 2,2-diethoxyacetophenone or benzophenone.  
     
     
         13 . The photosensitive material for non-substrate liquid crystal display according to  claim 11 , wherein said photosensitive polymerizable monomer comprises polyurethane type acrylates, acrylic monomer, epoxy compound, urethane acrylates, acrylic acrylates, epoxy acrylates, polyester acrylates.  
     
     
         14 . The photosensitive material for non-substrate liquid crystal display according to  claim 11 , wherein the mixing ratio of photo-initiator, photosensitive polymerizable monomers or oligomers, and modifier by weight is 2:96:2.  
     
     
         15 . The photosensitive material for non-substrate liquid crystal display according to  claim 11 , wherein said photosensitive material is polymerized and cured under the irradiation of 350-380 nm ultraviolet light at wavelength or high-pressure mercury lamp.  
     
     
         16 . The photosensitive material for non-substrate liquid crystal display according to  claim 15 , wherein said photosensitive material is polymerized and cured with 365 nm ultraviolet light.  
     
     
         17 . The photosensitive material for non-substrate liquid crystal display according to  claim 11 , wherein said photosensitive material is further mixed with liquid crystal material.  
     
     
         18 . The photosensitive material for non-substrate liquid crystal display according to  claim 11 , wherein said photosensitive material is further mixed with nanometer particles.