Apparatus for manufacturing magnetic recording disk, and in-line type substrate processing apparatus

Abstract

An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.

1 . An apparatus for manufacturing a magnetic recording disk, comprising: 
 a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate;    a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and    a transfer system that transfers the substrate from the magnetic-film deposition chamber to the lubricant-layer preparation chamber without exposing the substrate to atmosphere.    
   
   
       2 . An apparatus for manufacturing a magnetic recording disk, comprising: 
 a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate;    a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and    a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber.    
   
   
       3 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 2 , wherein, in said cleaning chamber, contaminants adhering to the substrate are removed by oxidizing the contaminants into volatile oxides, utilizing a reaction with oxygen ion or activated oxygen produced in oxygen plasma generated at a space facing the substrate.  
   
   
       4 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 2 , wherein, in said cleaning chamber, contaminants adhering to the substrate are removed by energy of laser beam irradiated onto the substrate.  
   
   
       5 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 2 , wherein, in said cleaning chamber, gas is blown onto the substrate, thereby blowing contaminants adhering to the substrate away from the substrate.  
   
   
       6 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 2 , further comprising a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.  
   
   
       7 . An apparatus for manufacturing a magnetic recording disk, comprising: 
 a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate;    an overcoat deposition chamber in which an overcoat is deposited on the substrate after the magnetic-film deposition, said overcoat deposition chamber comprising means for generating plasma in which oxygen ion or activated oxygen is produced, said oxygen ion or said activated oxygen oxidizing contaminants on the substrate into volatile oxides, thereby removing the contaminants; and    a transfer system that transfers the substrate from the magnetic-film deposition chamber to the overcoat deposition chamber without exposing the substrate to atmosphere.    
   
   
       8 . An apparatus for manufacturing a magnetic recording disk, comprising: 
 a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; and    a burnishing chamber in which a burnishing is carried out in vacuum after the magnetic-film deposition, said burnishing being a step where protrusions on the substrate are removed.    
   
   
       9 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 8 , further comprising a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate after the burnishing, and a transfer system that transfers the substrate from the burnishing chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.  
   
   
       10 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 8 , wherein said burnishing chamber comprises a burnishing tape that is rubbed against the substrate for the burnishing, and cleaning means for cleaning a surface of the burnishing tape prior to the burnishing.  
   
   
       11 . An apparatus for manufacturing a magnetic recording disk, comprising; 
 a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate,    a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate after the magnetic-film deposition, and    a post-preparation treatment chamber in which a post-preparation treatment is carried out onto the substrate in vacuum, said post-preparation treatment being a step of controlling adhesive strength and surface lubricity of the lubricant layer by heating or irradiating the lubricant layer.    
   
   
       12 . An apparatus for manufacturing a magnetic recording disk as claimed in  claim 11 , further comprising a transfer system that transfers the substrate from the lubricant-layer preparation chamber to the post-preparation treatment chamber without exposing the substrate to the atmosphere.  
   
   
       13 . An in-line type substrate processing apparatus, comprising: 
 a plurality of circumventive transfer paths;    a plurality of vacuum chambers provided along the transfer paths;    a connection transfer path connecting at least two of the circumventive transfer paths; and    a transfer system that transfers a substrate to be processed along the circumventive transfer paths, and transfers the substrate along the connection transfer path without exposing the substrate to atmosphere.