US2005095743A1PendingUtilityA1

Bonding a metal component to a low-K dielectric material

Priority: Feb 18, 2003Filed: Nov 10, 2004Published: May 5, 2005
Est. expiryFeb 18, 2023(expired)· nominal 20-yr term from priority
H10P 14/69391H10P 14/6922H10P 14/6342H10P 14/665H10P 14/6928H10P 14/6336H10P 14/6929
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Claims

Abstract

A dielectric material is strengthened by bonding a metal component to the dielectric matrix. The metal component may be a metal oxide or metal oxide precursor. The metal component may be deposited on the substrate with the dielectric material, or sol-gel chemistry may be used and the liquid solution spin-coated on a substrate.

Claims

exact text as granted — not AI-modified
1 - 12 . (canceled)  
   
   
       13 . A device comprising: 
 a semiconductor substrate having at least one layer with a plurality of conductive metal lines thereon;    a dielectric material between the metal lines, the dielectric material including a metal component bonded thereto comprising between about 1% and about 5% in atomic percent of the dielectric material.    
   
   
       14 . The device of  claim 13  wherein the dielectric material is at least 50% porous.  
   
   
       15 . The device of  claim 13  wherein the dielectric material is carbon-doped oxide.  
   
   
       16 . The device of  claim 13  wherein the dielectric material is fluorine doped silicon dioxide.  
   
   
       17 . The device of  claim 13  wherein the dielectric material is silicon dioxide.  
   
   
       18 . The device of  claim 13  wherein the metal component is an oxide of aluminum.  
   
   
       19 . The device of  claim 13  wherein the metal component is an oxide of magnesium.

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