Liquid crystal display device and method for manufacturing the same
Abstract
A method for manufacturing the LCD device includes forming a thin film transistor array having gate and data lines crossing to each other, defining pixel regions on a substrate, and thin film transistors arranged at crossings of the gate and data lines; forming a passivation layer over the entire surface of the substrate; forming a contact hole in the passivation layer exposing drain electrodes of each thin film transistor; forming an amorphous indium tin oxide film on the passivation layer; selectively crystallizing portions of the amorphous indium tin oxide film within the pixel regions by selectively irradiating light onto the amorphous indium tin oxide thin film; and forming a pixel electrode by selectively removing uncrystallized portions of the amorphous indium tin oxide thin film.
Claims
exact text as granted — not AI-modified1 - 19 . (canceled)
20 . A liquid crystal display (LCD) device, comprising:
a substrate; a plurality of gate lines; a plurality of data lines crossing the plurality of gate lines, wherein the plurality of gate and data lines defines a pixel region on the substrate; a thin film transistor arranged at crossings of the plurality of gate and data lines; and a pixel electrode formed of crystalline indium tin oxide within the pixel region.Join the waitlist — get patent alerts
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