Ceramic heater for semiconductor manufacturing and inspecting equipment

Abstract

A ceramic heater for a semiconductor producing/examining device including a ceramic substrate having a heating surface for receiving a semiconductor wafer, a heating device for generating heat sufficient for producing/examining the semiconductor wafer and formed on the heating surface or inside the ceramic substrate, and a temperature measuring device for measuring a temperature of the heating surface and pressed against the ceramic substrate.

1 . A ceramic heater for a semiconductor producing/examining device, comprising: 
 a ceramic substrate having a heating surface configured to receive a semiconductor wafer;    at least one heating device configured to generate heat sufficient for producing/examining the semiconductor wafer and formed on the heating surface or inside the ceramic substrate; and    a temperature measuring device configured to measure a temperature of the heating surface and pressed against the ceramic substrate.    
   
   
       2 . The ceramic heater for a semiconductor producing/examining device according to  claim 1 , further comprising a plate having a thermal conductivity higher than a thermal conductivity of the ceramic substrate, the plate being interposed between the ceramic substrate and temperature measuring device.  
   
   
       3 . The ceramic heater for a semiconductor producing/examining device according to  claim 1 , wherein the temperature measuring device is pressed by force of 1×10 −6  to 20 Kg.  
   
   
       4 . The ceramic heater for a semiconductor producing/examining device according to  claim 1 , wherein the temperature measuring device is pressed against a surface of the ceramic substrate on an opposite side of the heating surface.  
   
   
       5 . The ceramic heater for a semiconductor producing/examining device according to  claim 1 , wherein the temperature measuring device comprises a thermocouple and a sheath housing the thermocouple.  
   
   
       6 . The ceramic heater for a semiconductor producing/examining device according to  claim 5 , wherein the temperature measuring device is pressed against a surface of the ceramic substrate on an opposite side of the heating surface.  
   
   
       7 . A ceramic heater for a semiconductor producing/examining device, comprising: 
 a ceramic substrate having a heating surface configured to receive a semiconductor wafer;    heat generating means for generating heat sufficient for producing/examining the semiconductor wafer; and    temperature measuring means for measuring a temperature of the heating surface,    wherein the heat generating means is formed on the heating surface or inside the ceramic substrate, and the temperature measuring means is pressed against the ceramic substrate.