Etching apparatus of glass substrate

Abstract

The present invention discloses an etching apparatus comprising an etching bath having an etchant; an etchant recycling part in the etching bath; a DI and undiluted etchant supply part for supplying a DI water and a undiluted etchant; an etchant mixing part for mixing the DI water and the undiluted etchant; and an etchant heating part for heating the mixed etchant.

1 - 19 . (canceled)  
     
     
         20 . A method of etching a material, comprising: 
 providing an etchant in an etching bath;    providing a material to be etched in the etching bath to etch the material;    monitoring temperature of the etchant in the etching bath after the material is provided in the etching bath; and    stopping etching of the material in the etching bath when the temperature of the etchant is a predetermined value.    
     
     
         21 . The method of  claim 20 , further comprising: maintaining a constant concentration of the etchant in the etching bath.  
     
     
         22 . The method of  claim 20 , wherein the material to be etched is glass.  
     
     
         23 . The method of  claim 20 , wherein the etchant is HF.  
     
     
         24 . The method of  claim 20 , further comprising: heating the etchant in the etching bath.