US2005073078A1PendingUtilityA1
Frequency compensated oscillator design for process tolerances
Priority: Oct 3, 2003Filed: Oct 3, 2003Published: Apr 7, 2005
Est. expiryOct 3, 2023(expired)· nominal 20-yr term from priority
H03H 2009/0233H03H 9/2457Y10T29/49016H03H 9/2463H03H 2009/02299H03H 9/2447H03H 3/0077H03H 3/0076H03H 2009/02496H03H 3/0072
39
PatentIndex Score
0
Cited by
0
References
0
Claims
Abstract
A continuous or distributed resonator geometry is defined such that the fabrication process used to form a spring mechanism also forms an effective mass of the resonator structure. Proportional design of the spring mechanism and/or mass element geometries in relation to the fabrication process allows for compensation of process-tolerance-induced fabrication variances. As a result, a resonator having increased frequency accuracy is achieved.
Claims
exact text as granted — not AI-modified1 - 26 . (canceled).
27 . A resonator comprising:
a spring-mass mechanism, having an effective mechanical stiffness and an effective mechanical mass defined by a geometry; wherein the geometry and the effective mass of the spring-mass mechanism are simultaneously defined by application of a fabrication process to a constituent material; and wherein the geometry is defined such that application of the fabrication process to the constituent material results in little change to a ratio defined by a change in the effective mechanical stiffness and a change in the effective mechanical mass.
28 . The resonator of claim 27 wherein the geometry of the spring-mass mechanism comprises one or more voids formed in the length of the spring-mass mechanism.
29 . The resonator of claim 27 wherein the geometry of the spring-mass mechanism comprises an outer edge having a plurality of indentations, the plurality of indentations having the effect of increasing a surface area of the outer edge exposed to the fabrication process.
30 . The resonator of claim 27 wherein the spring-mass mechanism includes at least one mass structure that is formed integral to the spring-mass mechanism.
31 . The resonator of claim 30 wherein at least one of the mass structure comprises one or more voids formed in a body of the at least one mass structure.
32 . The resonator of claim 30 wherein at least one of the mass structure comprises an outer edge having a plurality of indentations, the plurality of indentations having the effect of increasing a surface area of the outer edge exposed to the fabrication process.
33 . The resonator of claim 32 wherein the at least one of the mass structure further comprises one or more voids formed respectively in a body of the at least one of the mass structure.
34 . The resonator of claim 27 wherein the spring-mass mechanism includes a plurality of mass structures that are formed integral to the spring-mass mechanism.
35 . The resonator of claim 34 wherein each of the plurality of mass structures includes one or more voids formed in a body of the mass structure.
36 . The resonator of claim 34 wherein each of the plurality of mass structures includes an outer edge having a plurality of indentations, wherein the plurality of indentations having the effect of increasing a surface area of the outer edge exposed to the fabrication process.
37 . The resonator of claim 36 wherein each of the plurality of mass structures further includes one or more voids formed in a body of the mass structure.
38 . The resonator of claim 27 wherein the spring-mass mechanism includes a plurality of spring structures that are formed integral to the spring-mass mechanism.
39 . The resonator of claim 38 wherein each of the plurality of spring structures includes one or more voids formed in a body of the spring structure.
40 . The resonator of claim 38 wherein each of the plurality of spring structures includes an outer edge having a plurality of indentations, and wherein the plurality of indentations having the effect of increasing a surface area of the outer edge exposed to the fabrication process.Join the waitlist — get patent alerts
Track US2005073078A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.