Polishing kit for magnetic disk
Abstract
A polishing kit for a magnetic disk containing (A) a slurry containing an alumina, (B) an oxidizing agent solution containing an oxidizing agent, and (C) an acid agent solution containing an acid; a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (D) an additive solution containing an oxidizing agent and an inorganic acid; and a polishing kit for a magnetic disk containing (A) a slurry containing an alumina, and (C) an acid agent solution containing an acid, wherein the polishing kit is used with an oxidizing agent solution (B) containing an oxidizing agent; and a polishing process for a magnetic disk substrate, including the steps of feeding a liquid mixture containing components of a specified polishing kit to a space between the magnetic disk substrate and a polishing cloth; and polishing the magnetic disk substrate with the liquid mixture. The polishing composition kit can be suitably used for the manufacture of high-quality magnetic disk substrates such as hard disks.
Claims
exact text as granted — not AI-modified1 . A polishing kit for a magnetic disk comprising:
(A) a slurry comprising an alumina; (B) an oxidizing agent solution comprising an oxidizing agent; and (C) an acid agent solution comprising an acid.
2 . The polishing kit according to claim 1 , wherein the alumina is α-alumina and θ-alumina, wherein the oxidizing agent is hydrogen peroxide, and wherein the acid is citric acid and sulfuric acid.
3 . A polishing kit for a magnetic disk comprising:
(A) a slurry comprising an alumina; and (D) an additive solution comprising an oxidizing agent and an inorganic acid.
4 . The polishing kit according to claim 3 , wherein the alumina is α-alumina and θ-alumina, wherein the oxidizing agent is hydrogen peroxide, and wherein the inorganic acid is sulfuric acid.
5 . The polishing kit according to claim 3 , further comprising an acid agent solution (c) comprising an organic acid.
6 . The polishing kit according to claim 5 , wherein the organic acid is citric acid.
7 . A polishing kit for a magnetic disk comprising:
(A) a slurry comprising an alumina; and (C) an acid agent solution comprising an acid, wherein the polishing kit is used with an oxidizing agent solution (B) comprising an oxidizing agent.
8 . The polishing kit according to claim 7 , wherein the alumina is α-alumina and θ-alumina, wherein the acid is sulfuric acid, and wherein the oxidizing agent is hydrogen peroxide.
9 . A polishing process for a magnetic disk substrate, comprising the steps of:
feeding a liquid mixture comprising (A) a slurry comprising an alumina, (B) an oxidizing agent solution comprising an oxidizing agent, and (C) an acid agent solution comprising an acid to a space between the magnetic disk substrate and a polishing cloth; and polishing the magnetic disk substrate with the liquid mixture.
10 . A polishing process for a magnetic disk substrate, comprising the steps of:
feeding a liquid mixture comprising (A) a slurry comprising an alumina, and (D) an additive solution comprising an oxidizing agent and an inorganic acid to a space between the magnetic disk substrate and a polishing cloth; and polishing the magnetic disk substrate with the liquid mixture.
11 . The polishing process according to claim 10 , wherein the liquid mixture further comprises (c) an acid agent solution comprising an organic acid.
12 . A method for manufacturing a polished magnetic disk substrate comprising the steps of:
(1) mixing (A) a slurry comprising an alumina, (B) an oxidizing agent solution comprising an oxidizing agent, and (C) an acid agent solution comprising an acid to give a polishing composition; (2) pressing the magnetic disk substrate against a polishing cloth of a polishing platen while applying pressure; and (3) moving the magnetic disk substrate and the polishing platen while feeding the polishing composition prepared in step (1) to a space between the magnetic disk substrate and the polishing cloth, thereby polishing the magnetic disk substrate.
13 . A method for manufacturing a polished magnetic disk substrate comprising the steps of:
(1) mixing (A) a slurry comprising an alumina, and (D) an additive solution comprising an oxidizing agent and an inorganic acid to give a polishing composition; (2) pressing the magnetic disk substrate against a polishing cloth of a polishing platen while applying pressure; and (3) moving the magnetic disk substrate and the polishing platen while feeding the polishing composition prepared in step (1) to a space between the magnetic disk substrate and the polishing cloth, thereby polishing the magnetic disk substrate.
14 . A method for manufacturing a polished magnetic disk substrate comprising the steps of:
(1) mixing (A) a slurry comprising an alumina, (D) an additive solution comprising an oxidizing agent and an inorganic acid, and (c) an acid agent solution comprising an organic acid to give a polishing composition; (2) pressing the magnetic disk substrate against a polishing cloth of a polishing platen while applying pressure; and (3) moving the magnetic disk substrate and the polishing platen while feeding the polishing composition prepared in step (1) to a space between the magnetic disk substrate and the polishing cloth, thereby polishing the magnetic disk substrate.Join the waitlist — get patent alerts
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