Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument

Abstract

A mask has a monocrystal substrate having opposite surfaces which are planes having Miller indices {110}. A plurality of penetrating holes are formed in the monocrystal substrate. An opening shape of each of the penetrating holes is a polygon and each side of the polygon is parallel with a plane in a group of the {111} planes. The wall surfaces of the penetrating holes are the {111} planes. In the method of manufacturing a mask, openings are formed in the etching resistant film corresponding to the shape of the penetrating holes and the monocrystal substrate is etched.

1 . A mask comprising: 
 a monocrystal substrate having opposite surfaces having Miller indices {110}; and    a plurality of penetrating holes formed in the monocrystal substrate,    wherein the openings have a polygonal shape, each side of the openings being parallel to a plane in a group of the {111} planes; and    wherein inside walls of the penetrating holes are the {111} planes.    
     
     
         2 . The mask as defined in  claim 1 , 
 wherein the shape of each of the openings is a parallelogram.    
     
     
         3 . The mask as defined in  claim 2 , 
 wherein the thickness W of the monocrystal substrate and the length L of a long side of the parallelogram have the relationship: {square root}3×W<L.    
     
     
         4 . The mask as defined in  claim 1 , 
 wherein the monocrystal substrate is a monocrystal silicon substrate.    
     
     
         5 . The mask as defined in  claim 1 , 
 further comprising a magnetic film formed on the monocrystal substrate.    
     
     
         6 . The mask as defined in  claim 1 , 
 wherein a thin portion is formed in a region in which the penetrating holes are formed, within the monocrystal substrate.    
     
     
         7 . The mask as defined in  claim 6 , 
 wherein the thin portion is formed avoiding an edge portion of the monocrystal substrate.    
     
     
         8 . The mask as defined in  claim 6 , wherein: 
 a plurality of the thin portions are formed in the monocrystal substrate; and    each of the thin portions is formed in a region including a group of the penetrating holes.    
     
     
         9 . A method of manufacturing an electro-luminescence device comprising: 
 forming a film of a light emitting material using the mask as defined in  claim 1 .    
     
     
         10 . An electro-luminescence device manufactured by the method as defined in  claim 9 .  
     
     
         11 . An electro-luminescence device comprising: 
 a plurality of light emitting layers each having an upper surface formed in a polygonal shape except a rectangle,    wherein the angle of each corner of the polygonal shape is substantially equal to the intersection angle between two planes among the planes having Miller indices {111}.    
     
     
         12 . The electro-luminescence device as defined in  claim 11 , 
 wherein the polygonal shape is a parallelogram.    
     
     
         13 . An electronic instrument having the electro-luminescence device as defined in  claim 10 .  
     
     
         14 . An electronic instrument having the electro-luminescence device as defined in  claim 11.