Wafer-level chip scale package
Abstract
A chip scale package implements solder bars to form a connection between a chip and a trace, formed in a substrate, such as another chip or PCB. Solder bars are formed by depositing one or more solder layers into the socket, or optionally, depositing a base metal layer into the socket and applying the solder layer to the base metal layer. The geometry of a solder bars may be rectangular, square, or other regular or irregular geometry. Solder bars provide a greater utilization of the connectivity footprint and increase the electrical and thermal flow capacity. Solder bars also provide a robust connection.
Claims
exact text as granted — not AI-modified1 . A method of constructing a preformed solder bar made-ready for installing a microchip, comprising:
forming a socket on a first surface of a microchip, such that the socket has predetermined physical dimensions complementary to those of a microchip connection pad footprint occupied by at least one contact pad area on the microchip, the socket presenting a conductive base capable of bonding to solder; bonding solder to the conductive base to place a solder bar in the socket and place the microchip in made-ready condition for installation.
2 . The method of claim 1 , wherein the microchip contains a silicon wafer and the step of forming the socket comprises
depositing an adhesion layer onto the wafer, and depositing under-bump-metallization (UBM) material contacting the adhesion layer to complete formation of the conductive base.
3 . The method of claim 2 , wherein the step of depositing the adhesion layer includes depositing a conductor selected from the group consisting of aluminum, nickel-vanadium, titanium, tungsten and copper.
4 . The method of claim 2 , wherein the step of depositing the UMB material includes depositing a conductor selected from at least one of titanium, tungsten, vanadium, tin, copper, aluminum, gold, silver, and lead.
5 . The method of claim 1 , wherein the step of forming the socket includes the predetermined dimensions selected from the group consisting of rectangular, “E,” “L,” and “U” shapes.
6 . The method of claim 1 , wherein the step of forming the socket includes the physical dimensions selected from the group consisting of ring, square, and circular shapes.
7 . The method of claim 1 , wherein the step of forming the socket includes the physical dimensions being complimentary to the solder bar having a planar rectilinear configuration.
8 . The method of claim 1 , wherein the step of forming the socket includes the physical dimensions being complimentary to the solder bar having a planar curvilinear configuration.
9 . The method of claim 1 , wherein the step of forming the socket further comprising a step of forming a passivation layer on substantially all of the first surface, exclusive of an area where the socket is located.
10 . The method of claim 9 , wherein the step of forming the passivation layer includes the steps of:
applying one or more layers of passivation material to the entire first surface; and removing selected portions of the passivation material covering the area where the socket is to be located.
11 . The method of claim 10 , wherein the step of applying one or more layers of passivation material includes applying at least one layer selected from the group consisting of polysilicon, silicon dioxide, and benzocyclobutane.
12 . The method of claim 1 , further comprises depositing a non-solder base metal in the socket after the step of forming the socket and prior to the step of bonding solder, such that the solder bar contains the non-solder base metal and the solder in respective layers.
13 . The method of claim 12 , wherein the step of depositing the non-solder base metal includes electroplating the non-solder base metal.
14 . A method of claim 12 , wherein the step of depositing the non-solder base metal includes screen printing at least one base metal layer.
15 . The method of claim 14 , wherein the step of depositing the non-solder base metal includes depositing the non-solder base metal layer selected from the group consisting of copper, gold, titanium, tungsten, and vanadium.
16 . The method of claim 1 , wherein the step of bonding solder includes electroplating one or more solder layers onto the conductive base.
17 . The method of claim 1 , wherein the step of bonding solder includes screen printing one or more solder layers onto the conductive base.
18 . A chip scale package made-ready for installation of a microchip on a printed circuit board or chip-on-chip stack, comprising:
a microchip including a first surface having a connection pad area; an adhesion layer contacting the connection pad; an under bump metallization layer contacting the adhesion layer; at least one passivation layer delineating an opening to the under bump metallization layer to define a socket; and a solder bar in contact with the under bump metallization layer, the solder bar having dimensions complementary to the socket and a geometric configuration selected from the group consisting of planar curvilinear and planar rectilinear configurations.
19 . The chip scale package of claim 18 , wherein the solder bar includes a base metal layer in contact with the under bump metallization layer and the solder layer.
20 . The chip scale package of claim 18 , wherein the geometric configuration includes a geometry selected from the group consisting of rectangular, “E,” “L,” and “U” shapes.
21 . The chip scale package of claim 18 , wherein the geometric configuration includes a geometry selected from the group consisting of ring, square, and circular shapes.
22 . The chip scale package of claim 18 , wherein the solder bar comprises a plurality of sublayers having different characteristics.
23 . The chip scale package of claim 18 , wherein the solder bar contains a base metal layer and a solder layer 24 . The chip scale package of claim 23 , wherein the base metal layer is selected form the group consisting of copper, gold, silver, lead, tin, titanium, tungsten, and vanadium.Join the waitlist — get patent alerts
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