Plasma treatment apparatus and surface treatment apparatus of substrate

Abstract

A plasma treatment apparatus of the present invention comprises: a plasma generation chamber 34 for activating gas supplied thereto so as to generate plasma; a depressurization chamber 50 which is connected to the plasma generation chamber 34 and which accommodates a member 52 to be plasma-treated; and a diffuser 58 which is provided at a joint part of the plasma generation chamber 34 and the depressurization chamber 50, which guides the plasma in a direction inclined to a gas flow path of the plasma generation chamber 34, and which introduces the plasma into the depressurization chamber 50 while diffusing the plasma in the depressurization chamber 50.

1 . A plasma treatment apparatus comprising: 
 a plasma generation chamber for activating gas supplied thereto so as to generate plasma;    a depressurization chamber connected to the plasma generation chamber and accommodating a member to be plasma-treated; and    a diffuser for guiding the plasma in a direction inclined to a gas flow path of the plasma generation chamber and for introducing the plasma into the depressurization chamber while diffusing the plasma in the depressurization chamber, said diffuser provided at a joint part of the plasma generation chamber and the depressurization chamber.    
     
     
         2 . The plasma treatment apparatus according to  claim 1 , wherein said diffuser is composed of a plurality of tubular bodies, and one end side of each tubular body is in intimate contact with one end side of another tubular body and is connected to the plasma generation chamber, while the other end sides of the respective tubular bodies are separated from each other.  
     
     
         3 . The plasma treatment apparatus according to  claim 1 , wherein an angle between an opening end which is opened in the depressurization chamber and an axis of each tubular body is determined in accordance with an angle of inclination of each tubular body.  
     
     
         4 . The plasma treatment apparatus according to  claim 1 , wherein said tubular body is cylindrically shaped.  
     
     
         5 . A surface treatment apparatus, comprising: 
 a plasma generation chamber for activating gas supplied thereto so as to generate plasma;    a depressurization chamber connected to the plasma generation chamber and accommodating a substrate with a conductive thin film and an organic thin film formed on a main surface thereof; and    a diffuser for guiding the plasma in a direction inclined to a gas flow path of the plasma generation chamber and for introducing the plasma into the depressurization chamber while diffusing the plasma in the depressurization chamber, said diffuser provided at a joint part of the plasma generation chamber and the depressurization chamber,    wherein a surface of the conductive thin film formed on the substrate is treated using different gas plasma by successively feeding different material gases to the plasma generation chamber.