Electron beam device and method for stereoscopic measurements

Abstract

An electron beam device according to the present invention is made up of an electron beam source for emitting an electron beam, an electron optical system for irradiating the electron beam onto a specimen, a specimen holder for holding the specimen, a specimen tilting section for producing relative tilt angles between the specimen holder and the electron beam, an electron beam detecting section for detecting electron beam emitted from the specimen, and a data correcting section for correcting the three-dimensional detection data to have specified relationship under the condition of a relative tilt angle between the specimen holder and the electron beam.

1 . A method of manufacturing reference templates using an electron beam device having an electron beam source for emitting an electron beam, an electron optical system for directing said electron beam onto said specimen, a specimen holder for holding said specimen, a specimen tilting section for producing a relative tilt angle between said specimen holder and an incident electron beam, and an electron beam detecting section for detecting an electron beam emitted from said specimen, comprising: 
 placing a reference template on said specimen holder;    moving and irradiating said electron beam to positions on said reference template where reference marks are to be formed; and    forming reference marks on said reference template on the basis of the electron beams detected with said electron beam detecting section.    
   
   
       2 . A method of preparing reference templates according to  claim 1 , wherein said reference marks are formed with at least four points of contamination or defects.  
   
   
       3 . A method of preparing reference templates according to  claim 1 , wherein forming said reference marks is deemed to be completed when signals of electron beams detected with said electron beam detecting section reaches a predetermined level.  
   
   
       4 . A method of preparing reference templates according to  claim 1 , wherein the electron beam for forming said reference marks is made greater in diameter than the electron beam for detecting images of said specimen using said electron beam detecting section in said electron beam device.  
   
   
       5 . A method of preparing reference templates according to  claim 1 , wherein the electric current value for the electron beam for creating said reference marks is controlled to be greater when said reference marks are being formed than when said electron beam is being moved over said reference template.  
   
   
       6 . A reference template prepared using an electron beam device having an electron beam source for emitting an electron beam, an electron optical system for directing said electron beam onto said specimen, a specimen holder for holding said specimen, a specimen tilting section for producing a relative tilt angle between said specimen holder and an incident electron beam, and an electron beam detecting section for detecting an electron beam emitted from said specimen, in the steps of: 
 (i) placing said reference template on said specimen holder;    (ii) moving and irradiating said electron beam to the positions on said reference template where reference marks are to be formed; and    (iii) forming reference marks on said reference template on the basis of the electron beam detected with said electron beam detecting section.