US2005038216A1PendingUtilityA1
Silicon-containing polymer, process for its production, resist composition employing it, pattern-forming method and electronic device fabrication method
Est. expiryApr 23, 2019(expired)· nominal 20-yr term from priority
H10P 50/71H01C 7/006C08G 77/02E04H 12/32G03F 7/0757G03F 7/0045C09D 183/02G09F 2017/0025
45
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Claims
Abstract
A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.
Claims
exact text as granted — not AI-modified1 . A process for production of a silicon-containing polymer comprising the structure presented by formula 1 below as a main structural unit
where R 1 represents a monovalent organic group, R 2 represents a direct bond or a divalent organic group, R 3 represents a monovalent organic group of an organosilyl group, any of which groups may be of different types, X represents hydrogen, a monovalent organic group or an organosilyl group, which groups may be of different types, k and l are positive integers, m and n are 0 or positive integers, and these subscripts satisfy the following relationship
0
<
1
1
+
m
+
n
≦
0.8
0
<
m
1
+
m
<
0.2
,
wherein tetraethoxysilane is used as the starting silicone monomer for formation of the polymer skeleton during production of the silicon-containing polymer, and a carboxyl group-containing compound is added that does not react with the starting silicone monomer or the resulting silicon-containing polymer in the synthesis solvent.
2 . The process for production of a silicon-containing polymer according to claim 1 , wherein at least some of the X groups are triorganosilyl groups.
3 . The process for production of a silicon-containing polymer according to claim 2 , wherein said triorganosilyl groups include photosensitive crosslinkable groups.
4 . The process for production of a silicon-containing polymer according to claim 1 , wherein R 8 is —(CH 2 ) a — and a is an integer of 1-10.
5 . A process for production of a silicon-containing polymer comprising the structure represented by formula 2 below as a main structural unit
where R 1 represents a monovalent organic group, R 2 represents a direct bond or a divalent organic group, R 3 represents a monovalent organic group of an organosilyl group, any of which groups may be of different types, X represent hydrogen, a monovalent organic group or an organosilyl group, which groups may be of different types, wherein at least some of the X group and wherein the photosensitive crosslinkable group is chloromethylphenylethyl, wherein R 4 , R 5 and R 6 may be one or more different types of organic groups, k, l and o are positive integers, m and n are 0 or positive integers, and these subscripts satisfy the following relationships
0
<
1
1
+
m
+
n
+
o
≦
0.8
0
<
1
1
+
m
+
n
≦
0.8
0
<
m
1
+
m
<
0.2
,
wherein tetraethoxysilane is used as the starting silicone monomer for formation of the polymer skeleton during production of the silicon-containing polymer, and a carboxyl group-containing compound is added that does not react with the starting silicone monomer or the resulting silicon-containing polymer in the synthesis solvent.
6 . The process for production of a silicon-containing polymer according to claim 5 , wherein R 8 is —(CH 2 ) a — and a is an integer of 1-10.
7 . A process for production of a silicon-containing polymer comprising the structure presented by formula 3 below as a main structural unit
where R 1 represents a monovalent organic group, R 2 represents a direct bond or a divalent organic group, R 7 and R 8 each independently represent a monovalent organic group or an organosilyl group, any of which groups may be of different types, X represents hydrogen, a monovalent organic group or an organosilyl group, which groups may be of different types, k and q are positive integers, l, n, and p are 0 or positive integers, and these subscripts satisfy the following relationship:
0
<
1
1
+
n
+
p
+
q
≦
0.8
0
<
q
1
+
n
+
p
+
q
<
0.2
,
wherein tetraethoxysilane is used as the starting silicone monomer for formation of the polymer skeleton during production of the silicon-containing polymer, and a carboxyl group-containing compound is added that does not react with the starting silicone monomer or the resulting silicon-containing polymer in the synthesis solvent.
8 . The process for production of a silicon-containing polymer according to claim 7 , wherein at least some of the X groups are triorganosily groups.
9 . The process for production of a silicon-containing polymer according to claim 7 , wherein R 8 is a functional group that is eliminated by an acid catalyst.
10 . The process for production of a silicon-containing polymer according to claim 7 , wherein R 8 is —(CH 2 ) a — and a is an integer of 1-10.Join the waitlist — get patent alerts
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