Projection exposure apparatus and device manufacturing method

Abstract

Disclosed is an exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, wherein the apparatus includes a projection optical system for projecting the pattern of the reflection type mask onto the substrate, the projection optical system having a stop, wherein the stop has a first opening for defining a numerical aperture of the projection optical system, and a second opening through which light from the reflection type mask passes. This structure effective avoids unwanted physical interference among optical components of an illumination system or the projection optical system even when the size of the whole exposure apparatus is made compact to some degree.

1 - 8 . (Canceled)  
   
   
       9 . An exposure apparatus for illuminating a reflection type mask with light from a light source and for exposing a substrate with a pattern of the illuminated reflection type mask, said apparatus comprising: 
 a projection optical system for forming an intermediate image of the pattern of the reflection type mask and for re-imaging the intermediate image upon the substrate;    wherein said projection optical system has a field stop at or adjacent the position where the intermediate image is formed.    
   
   
       10 . An apparatus according to  claim 9 , wherein said field stop has an opening of variable shape.  
   
   
       11 . An apparatus according to  claim 10 , wherein the opening of said field stop has a width with respect to a scan direction, which width is locally adjustable.  
   
   
       12 . An apparatus according to  claim 11 , wherein the shape of the opening of said field stop is adjusted in response to a change of a coherence factor.  
   
   
       13 . An apparatus according to  claim 11 , wherein the shape of the opening of said field stop is adjusted in response to a change of an illumination mode.  
   
   
       14 - 16 . (Canceled)  
   
   
       17 . A device manufacturing method, comprising the steps of: 
 exposing a substrate with a pattern by use of an exposure apparatus as recited in  claim 9;  and    developing the exposed substrate.    
   
   
       18 . (Canceled)