US2005029588A1PendingUtilityA1
Protection circuit device using MOSFETs and a method of manufacturing the same
Est. expirySep 4, 2020(expired)· nominal 20-yr term from priority
H10W 72/5522H10W 74/00H10W 72/0198H10W 72/884H10W 72/5449H10W 90/756H10W 72/5445H10W 72/5363H10W 72/536H10W 72/5475H10W 72/926H10W 90/736H10P 72/7438H10W 70/042H10W 74/111H10D 30/60
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Claims
Abstract
A protection circuit device using a MOSFET has a plural of conductive paths separated electrically, a MOSFET chip integrating two power MOSFETs in one chip where a gate electrode and a source electrode are fixed on the desired conductive path, conductive material provided on a common drain electrode of the MOSFET, and insulating resin covering said MOSFET, and supporting said conductive path in one body. Removing a drawing-around of the common drain electrode and fixing the source electrode directly on the conductive path, low ON-state resistance is realized.
Claims
exact text as granted — not AI-modified1 - 8 . (Canceled)
9 . A method for manufacturing a protection circuit device using MOSFETs comprising the steps of:
forming a trench on a surface of a conductive foil, except for a region to be a conductive path, a thickness of the trench is thinner than that of the conductive; bonding each gate electrode and each source electrode of a MOSFET chip integrating two MOSFETs on said desired conductive path in one chip; bonding conductive material on a common electrode of the MOSFET; molding said MOSFET chip so as to be covered with insulating resin and to fill into said trench; and removing said conductive foil of part of thickness where said trench is not provided.
10 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , wherein the step of forming a trench comprises the steps of:
forming an etching-tolerant conductive film on a region to be a conductive path on a surface of a conductive foil; and forming the trench by using the etching-tolerant conductive film as a mask.
11 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , further comprising:
dividing into a plurality of devices by said insulating resin, wherein the devices comprises each of chip mounting portions.
12 . A method for manufacturing a protection circuit device using MOSFETs, further comprising the step of:
removing uniformly said conductive foil from a back face so that a back face of said conductive path and said insulating resin embedded between said trench, are substantially flat face.
13 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , comprising the steps of:
forming a conductive path having a lot of mounting portions by forming a thinner separated groove than thickness of said leading foil on at least said leading foil except area becoming the leading path; bonding each gate electrode and each source electrode of a MOSFET chip integrating two MOSFETs on said desired conductive path of each mounting portion in one chip; bonding conductive material on a common electrode of the MOSFET; removing uniformly said conductive foil from a back face so that a back face of said conductive path and said insulating resin embedded between said trench, are substantially flat face; and dividing into a plurality of devices by said insulating resin, wherein the devices comprises each of chip mounting portions.
14 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , wherein said conductive foil consists of any of copper, aluminum, iron-nickel.
15 . A method for manufacturing a protection circuit device using MOSFETs according to claim 10 , characterized by that said conductive film is plated with any of nickel, gold and silver
16 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , wherein said trench formed selectively at said conductive foil is formed by chemical or physical etching.
17 . A method for manufacturing a protection circuit device using MOSFETs according to claim 15 , wherein said conductive film is used as a part of a mask at forming said trench
18 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , wherein said conductive material is formed by a conductive metal plate or conductive brazing material.
19 . A method for manufacturing a protection circuit device using MOSFETs according to claim 9 , wherein said insulating resin is a package formed by transfer mould.
20 . A method for manufacturing a protection circuit device using MOSFETs according to claim 11 , wherein said dividing step comprises a step of forming notches having a predetermined depth by using a dicing saw and dividing into each of the chip mounting areas.Join the waitlist — get patent alerts
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