US2005028928A1PendingUtilityA1
Substrate processing apparatus and substrate processing method
Est. expiryAug 5, 2023(expired)· nominal 20-yr term from priority
Inventors:Fuminori Asa
H10P 72/0478H10P 72/0462
35
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Claims
Abstract
A transmitting window is provided on one side of a casing opposite to a substrate outlet. An ionizer is provided outside the transmitting window of a cleaning unit. The transmitting window is made of a polyimide resin or an acrylic resin, for example. Weak X-rays emitted from the ionizer pass through the transmitting window to reach the substrate outlet, shutter, spin chuck, guard, and the like in the cleaning unit. The spin chuck comprises a plurality of conductive holding pins.
Claims
exact text as granted — not AI-modified1 . A substrate processing apparatus comprising:
a substrate holding device that holds a substrate; an X-ray irradiator that directs X-rays toward at least part of an atmosphere including said substrate holding device; and a partition arranged between said substrate holding device and said X-ray irradiator, said partition having an X-ray transparent part on at least one part thereof that transmits the X-rays generated by said X-ray irradiator.
2 . The substrate processing apparatus according to claim 1 , wherein the X-rays generated by said X-ray irradiator are electromagnetic waves having a wavelength not smaller than 1.3 angstroms and an energy intensity ranging from 3 eV to 9.5 eV.
3 . The substrate processing apparatus according to claim 1 , wherein at least one part of said substrate holding device coming into contact with said substrate is made of a conductive material.
4 . The substrate processing apparatus according to claim 3 , wherein said conductive material includes a conductive resin.
5 . The substrate processing apparatus according to claim 4 , wherein said conductive resin includes conductive poly ether ether ketone.
6 . The substrate processing apparatus according to claim 3 , wherein said conductive material includes a metal material.
7 . The substrate processing apparatus according to claim 6 , wherein said metal material includes gold or platinum.
8 . The substrate processing apparatus according to claim 1 , wherein said X-ray transparent part is made of a resin material.
9 . The substrate processing apparatus according to claim 8 , wherein said resin material includes a polyimide resin.
10 . The substrate processing apparatus according to claim 8 , wherein said resin material includes an acrylic resin.
11 . The substrate processing apparatus according to claim 1 , wherein said substrate holding device rotates the substrate while holding the substrate.
12 . The substrate processing apparatus according to claim 1 , further comprising a process fluid supplier that supplies a process fluid to the substrate held by said substrate holding device.
13 . The substrate processing apparatus according to claim 12 , further comprising a splash guard surrounding the periphery of the substrate held by said substrate holding device, and preventing the process fluid from splashing,
said X-ray irradiator directing X-rays toward an atmosphere near said splash guard.
14 . The substrate processing apparatus according to claim 1 , further comprising a thermal processor that thermally treats the substrate held by said substrate holding device.
15 . The substrate processing apparatus according to claim 1 , wherein said X-ray irradiator directs X-rays toward an atmosphere near said substrate holding device.
16 . The substrate processing apparatus according to claim 1 , wherein said X-ray irradiator directs X-rays toward a downflow above said substrate holding device.
17 . The substrate processing apparatus according to claim 1 , further comprising a process chamber surrounding the periphery of said substrate holding device,
said partition being one side of said process chamber.
18 . The substrate processing apparatus according to claim 17 , wherein said process chamber has an opening for carrying the substrate into/out of said process chamber,
said X-ray irradiator directing X-rays toward an atmosphere near said opening.
19 . The substrate processing apparatus according to claim 1 , further comprising a substrate transport device,
said X-ray irradiator directing X-rays such that the X-rays cross a moving path of the substrate transported by said substrate transport device.
20 . The substrate processing apparatus according to claim 1 , further comprising a substrate transport device,
said X-ray irradiator directing X-rays toward a downflow above the moving path of the substrate transported by said substrate transport device.
21 . A substrate processing apparatus comprising:
a substrate holding device that holds a substrate; and a static eliminator that removes static electricity from an atmosphere including said substrate holding device, at least one part of said substrate holding device coming into contact with said substrate being made of a conductive material.
22 . A substrate processing method comprising the steps of:
holding a substrate by a substrate holding device; processing the substrate held by said substrate holding device; and directing X-rays to an atmosphere including said substrate holding device through an X-ray transparent part provided on at least one part of a partition.
23 . The substrate processing method according to claim 22 , wherein said step of holding the substrate includes the step of holding the substrate by a substrate holding device whose at least one part coming into contact with the substrate is made of a conductive material.
24 . A substrate processing method comprising the steps of:
holding a substrate by a substrate holding device whose at least one part coming into contact with a substrate is made of a conductive material; processing the substrate held by said substrate holding device; and removing static electricity from an atmosphere including said substrate holding device.Join the waitlist — get patent alerts
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