Liquid crystal display device and method for fabricating the same
Abstract
A liquid crystal display device includes a first substrate having a plurality of thin film transistors and a plurality of metal lines, a first insulation material layer formed on the metal lines, a second insulation material layer formed on the first insulation material layer on the metal lines, a first hole formed in the second insulation material layer over at least two of the metal lines, a second contact hole formed in the first and second insulation layers exposing a drain electrode of the thin film transistors, a pixel electrode connected to the drain electrode through the second contact hole, a sealing material formed within the first hole, a second substrate bonded to the first substrate via the sealing material, and a liquid crystal material disposed between the first and second substrates.
Claims
exact text as granted — not AI-modified1 . A liquid crystal display device, comprising:
a first substrate having a plurality of thin film transistors and a plurality of metal lines; a first insulation material layer formed on the metal lines; a second insulation material layer formed on the first insulation material layer on the metal lines; a first hole formed in the second insulation material layer over at least two of the metal lines; a second contact hole formed in the first and second insulation layers exposing a drain electrode of the thin film transistors; a pixel electrode connected to the drain electrode through the second contact hole; a sealing material formed within the first hole; a second substrate bonded to the first substrate via the sealing material; and a liquid crystal material disposed between the first and second substrates.
2 . The device according to claim 1 , wherein the first insulation material layer includes at least one inorganic insulating material and the second insulation material layer includes at least one organic insulating material.
3 . The device according to claim 2 , wherein the at least one organic insulating material include at least one of photo acryl and benzocyclobutene.
4 . The device according to claim 1 , wherein the thin film transistor comprises:
a gate electrode formed on the first substrate; a gate insulation layer formed on the gate electrode and an entire surface of the first substrate; a semiconductor layer formed on the gate insulation layer; and a source/drain electrode formed on the semiconductor layer.
5 - 9 . (Canceled).
10 . A liquid crystal display device, comprising:
a first substrate having a pixel region and a sealing region; a plurality of metal lines disposed within the sealing region; a thin film transistor disposed within the pixel region; a first electrically insulating material disposed over the metal lines and the thin film transistor; a second electrically insulating material, different from the first electrically insulating material, disposed on the first electrically insulating material layer over the metal lines and the thin film transistor; a first hole formed within the second electrically insulating material over the metal lines; a second hole formed within the first and second electrically insulating materials exposing a drain electrode of the thin film transistor; a pixel electrode electrically connected to the drain electrode through the second hole; a sealing material formed within the first hole contacting the first electrically insulating material; a second substrate bonded to the first substrate via the sealing material; and a liquid crystal material disposed between the first and second substrates.
11 . The device according to claim 10 , wherein the first electrically insulating material includes inorganic insulating materials and the second electrically insulating material includes organic insulating materials.
12 . The device according to claim 11 , wherein the organic insulating materials include at least one of photo acryl and benzocyclobutene.
13 . The device according to claim 10 , wherein the thin film transistor comprises:
a gate electrode formed directly on a first surface of the first substrate; a gate insulation layer formed on the gate electrode and the entire first surface of the first substrate; a semiconductor layer formed on the gate insulation layer; and a source/drain electrode formed on the semiconductor layer.
14 . The device according to claim 13 , wherein the first electrically insulating material is disposed on the source/drain electrode.
15 . The device according to claim 10 , wherein the first electrically insulating material include a plurality of concave portions formed between each of the plurality of metal lines.
16 . The device according to claim 15 , wherein the sealing material contacts at least two of the plurality of concave portions of the first electrically insulating material.
17 . The device according to claim 10 , wherein the sealing material contacts the second electrically insulating material.
18 . The device according to claim 10 , wherein the sealing material extends past sidewalls of the first hole along an upper surface of the second electrically insulating material.
19 . The device according to claim 10 , wherein the sealing material contacts concave and convex portions of the first electrically insulating material at a bottom portion of the first hole.
20 . The device according to claim 19 , wherein the sealing material contacts sidewall portions of the second electrically insulating material within the first hole.Join the waitlist — get patent alerts
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