Method for manufacturing a light guide plate mold
Abstract
A method for manufacturing a light guide plate mold includes the steps of: forming a photo-resist film ( 210 ) on a substrate ( 200 ); disposing a gray level mask ( 220 ) having a predetermined pattern over the substrate, illuminating the photo-resist film through the gray level mask by illuminating rays; developing the photo-resist film to form a photo-resist pattern ( 211 ) on the substrate; etching simultaneously the substrate and the photo-resist pattern to form a stamper ( 201 ); coating a metal-plating layer ( 230 ) over the stamper; electroforming the stamper coated with the metal-plating layer to form a master stamper ( 240 ); and stripping the metal-plating layer from the master stamper to attain the light guide plate mold. The method is highly precise and simple.
Claims
exact text as granted — not AI-modified1 . A method for manufacturing a light guide plate mold, comprising the steps of:
forming a photo-resist film on a substrate; disposing a gray level mask having a predetermined pattern over the substrate, and illuminating the photo-resist film through the gray level mask; developing the photo-resist film to form a photo-resist pattern on the substrate; etching simultaneously the substrate and the photo-resist pattern to form a stamper; coating a metal-plating layer over the stamper; and electroforming the stamper coated with the metal-plating layer to form a master stamper; and stripping the metal-plating layer from the master stamper to attain the light guide plate mold.
2 . The method according to claim 1 , wherein the photo-resist pattern formed by the developing step comprises a plurality of V-shaped grooves.
3 . The method according to claim 1 , wherein the illumination is by yellow rays.
4 . The method according to claim 1 , wherein the illumination is by ultraviolet rays.
5 . The method according to claim 1 , wherein the stamper formed by the etching step has a plurality of V-shaped grooves thereon.
6 . The method according to claim 1 , wherein the step of etching comprises dry-etching.
7 . The method according to claim 6 , wherein the dry-etching is plasma dry-etching.
8 . The method according to claim 1 , further comprising the step of forming a thin film layer before forming the photo-resist film on the substrate.
9 . The method according to claim 1 , wherein the photo-resist film is formed by a spin-coating process.
10 . The method according to claim 1 , wherein the photo-resist film is formed by a dip-coating process.
11 . The method according to claim 1 , wherein the photo-resist film is formed by a roll-coating process.
12 . The method according to claim 1 , wherein the photo-resist film is formed by a spray-coating process.
13 . The method according to claim 1 , wherein the photo-resist film is formed by an extrusion slot-coating process.
14 . The method according to claim 1 , wherein the photo-resist film comprises positive photo-resist material.
15 . The method according to claim 1 , wherein the photo-resist film comprises negative photo-resist material.
16 . A method for manufacturing a light guide plate mold, comprising the steps of:
forming a photo-resist film on a substrate; disposing a gray level mask having a predetermined pattern over the substrate, and illuminating the photo-resist film through the gray level mask; developing the photo-resist film to form a photo-resist pattern on the substrate; etching the substrate to form a stamper having a first set of densely arranged V-shaped slots in an upper face thereof; coating a metal-plating layer over the stamper; and electroforming the stamper coated with the metal-plating layer to form a master stamper; and stripping the metal-plating layer from the master stamper to attain the light guide plate mold; wherein said master stamper defines a second set of densely arranged V-shaped slots in an upper face thereof corresponding to the first set of densely arranged V-shaped slots.Join the waitlist — get patent alerts
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