US2005008767A1PendingUtilityA1
Phosphor panel with good humidity resistance
Priority: Aug 23, 2001Filed: Aug 6, 2004Published: Jan 13, 2005
Est. expiryAug 23, 2021(expired)· nominal 20-yr term from priority
G21K 4/00C09K 11/7733G21K 2004/10G21K 2004/06
44
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Claims
Abstract
A phosphor panel with a protective coating divided in at least two layers: a layer A, being closest to said phosphor layer and a layer B farther away from said phosphor layer wherein the layer A has a lower water vapour permeability coefficient than the layer B. Layer A has a water vapour permeability coefficient, P, so that 0 ≤ P ≤ 1 × 10 - 11 cm 3 ( STP ) · cm cm 2 · s · Pa .
Claims
exact text as granted — not AI-modified1 . A phosphor panel comprising a phosphor layer and a protective layer, wherein the phosphor layer has a main surface and edges, characterized in that said protective layer is divided in at least two layers:
a layer A, being closest to said phosphor layer and a layer B farther away from said phosphor layer; and wherein said layer A has a lower water vapour permeability coefficient than said layer B.
2 . A phosphor panel according to claim 1 , wherein said layer A has a water vapour permeability coefficient, P, so that
0
≤
P
≤
1
×
10
-
11
cm
3
(
STP
)
·
cm
cm
2
·
s
·
Pa
.
3 . A phosphor panel according to claim 1 , wherein said layer B is an outermost layer and has a thickness, t, and looses in a Taber abrasion test (sandpaper P220, load 250 g, 500 cycles) at most 25% of said thickness t.
4 . A phosphor panel according to claim 1 , wherein said layer A is adjacent to the said phosphor layer and contains a layer of parylene.
5 . A phosphor panel according to claim 4 , wherein said parylene is selected from the group consisting of parylene C, parylene D and parylene HT.
6 . A phosphor panel according to claim 1 , wherein said layer A has a thickness in the range between 0.05 μm and 15 μm.
7 . A phosphor panel according to claim 1 , wherein said layer B is a radiation cured polymeric layer.
8 . A phosphor panel according to claim 2 , wherein said layer A is adjacent to said phosphor layer and contains a layer of parylene.
9 . A phosphor panel according to claim 6 , wherein said parylene is selected from the group consisting of parylene C, parylene D and parylene HT.
10 . A phosphor panel according to claim 2 , wherein said layer A has a thickness in the range between 0.05 μm and 15 μm.
11 . A phosphor panel according to claims 2 , wherein said layer B is a radiation cured polymeric layer.
12 . A phosphor panel according to claim 3 , wherein said layer A is adjacent to the said phosphor layer and contains a layer of parylene.
13 . A phosphor panel according to claim 8 , wherein said parylene is selected from the group consisting of parylene C, parylene D and parylene HT.
14 . A phosphor panel according to claim 3 wherein said layer A has a thickness in the range between 0.05 μm and 15 μm.
15 . A phosphor panel according to claim 3 , wherein said layer B is a radiation cured polymeric layer.
16 . A phosphor panel according to claim 1 , wherein said phosphor layer is a photostimulable phosphor layer.
17 . A phosphor panel according to claim 16 , wherein said panel comprises a binderless photostimulable phosphor layer.
18 . A phosphor panel according to claim 17 , wherein said binderless photostimulable phosphor layer contains a CsX:Eu stimulable phosphor, wherein X represents a halide selected from the group consisting of Br and Cl.
19 . A method for the preparation of a binderless phosphor panel comprising the steps of:
providing a support, vapour depositing a CsX:Eu phosphor, wherein X representing a halide selected from the group consisting of Br and Cl, thereby forming a binderless phosphor layer on the said support, applying a layer of parylene on the said binderless phosphor layer by chemical vapour deposition, thereby forming a layer A; applying a radiation curable solution on top of the said layer A; and curing said panel by UV exposure, thereby forming layer B.
20 . A method according to claim 19 , further including a step of applying an edge reinforcement.
21 . A method for the preparation of a binderless phosphor panel comprising the steps of
providing a support, vapour depositing a CsX:Eu phosphor, wherein X represents a halide selected from the group consisting of Br and Cl, thereby forming a binderless phosphor layer on the said support, applying a layer of parylene on the said binderless phosphor layer by chemical vapour deposition, forming a layer A; applying a radiation curable solution on top of the said layer A; and curing said panel by electron beam exposure, thereby forming layer B.
22 . A method according to claim 21 , further including a step of applying an edge reinforcement.Join the waitlist — get patent alerts
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