US2005006026A1PendingUtilityA1

Transfer apparatus, cleaning apparatus, chemical processing apparatus, and method for manufacturing circuit substrate

Assignee: SEIKO EPSON CPRPORATIONPriority: May 29, 2003Filed: May 27, 2004Published: Jan 13, 2005
Est. expiryMay 29, 2023(expired)· nominal 20-yr term from priority
Inventors:Tsugio Gomi
H10P 72/0414B08B 3/022H05K 2203/075H05K 1/0393H05K 3/26H05K 2203/1545C23F 1/08B08B 3/041H05K 3/0085C23G 3/02
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Claims

Abstract

A transfer apparatus includes a reservoir tank that stores a fluid, a supply device that supplies the fluid into the reservoir tank such that the fluid overflows from the reservoir tank, and a transfer device that transfers an object to be transferred while floating the object to be transferred on the fluid.

Claims

exact text as granted — not AI-modified
1 . A transfer apparatus, comprising: 
 a reservoir tank that stores a fluid;    cleaning liquid supply unit that supplies the fluid into the reservoir tank such that the fluid overflows from the reservoir tank; and    transfer device that transfers an object to be transferred while floating the object to be transferred on the fluid.    
     
     
         2 . A transfer apparatus, comprising: 
 a support member that supports an object to be transferred;    cleaning liquid flowing unit that supplies a fluid on the support member such that the fluid flows along a transfer direction of the object to be transferred; and    transfer device that transfers the object to be transferred while floating the object to be transferred on the fluid.    
     
     
         3 . A cleaning apparatus, comprising: 
 a reservoir tank that stores a cleaning liquid;    cleaning liquid supply unit that supplies the cleaning liquid into the reservoir tank such that the cleaning liquid overflows from the reservoir tank;    transfer device that transfers an object to be transferred while floating the object to be transferred on the cleaning liquid; and    cleaning liquid jetting unit that jets the cleaning liquid on the object to be transferred that floats on the cleaning liquid.    
     
     
         4 . The cleaning apparatus according to  claim 3 , further comprising: 
 a cleaning liquid collecting tank that collects the cleaning liquid overflowed from the reservoir tank; and    cleaning liquid circulating unit that circulates the cleaning liquid collected to the reservoir tank.    
     
     
         5 . A cleaning apparatus, comprising: 
 a support member that supports an object to be transferred;    cleaning liquid flowing unit that supplies a cleaning liquid on the support member such that the cleaning liquid flows along a transfer direction of the object to be transferred;    transfer device that transfers the object to be transferred while floating the object to be transferred on the cleaning liquid; and    cleaning liquid jetting unit that jets the cleaning liquid on the object to be transferred that floats on the cleaning liquid.    
     
     
         6 . A chemical processing apparatus, comprising: 
 a reservoir tank that stores a chemical;    chemical supply unit that supplies the chemical into the reservoir tank such that the chemical overflows from the reservoir tank;    transfer device that transfers an object to be transferred while floating the object to be transferred on the chemical; and    chemical jetting unit that jets the chemical on the object to be transferred that floats on the chemical.    
     
     
         7 . A chemical processing apparatus, comprising: 
 a support member that supports an object to be transferred;    chemical flowing unit that supplies a chemical on the support member such that the chemical flows along a transfer direction of the object to be transferred;    transfer device that transfers the object to be transferred while floating the object to be transferred on the chemical; and    chemical jetting unit that jets the chemical on the object to be transferred that floats on the chemical.    
     
     
         8 . A method for manufacturing a circuit substrate, comprising: 
 overflowing a cleaning liquid or a chemical from a reservoir tank;    transferring a circuit substrate while floating the circuit substrate on the cleaning liquid or the chemical overflowed from the reservoir tank; and    cleaning or chemical-processing the circuit substrate by jetting the cleaning liquid or the chemical onto the circuit substrate that is transferred.    
     
     
         9 . A method for manufacturing a circuit substrate, comprising: 
 flowing a cleaning liquid or a chemical along a transfer direction of a tape substrate;    transferring a circuit substrate while floating the circuit substrate on the cleaning liquid or the chemical that flows along the transfer direction of the tape substrate; and    cleaning or chemical-processing the circuit substrate by jetting the cleaning liquid or the chemical onto the circuit substrate that is transferred.    
     
     
         10 . The transfer apparatus according to  claim 1 , further comprising: 
 a cleaning liquid collecting tank that collects the cleaning liquid overflowed from the reservoir tank; and    cleaning liquid circulating unit that circulates the cleaning liquid collected to the reservoir tank.    
     
     
         11 . The transfer apparatus according to  claim 2 , further comprising: 
 a cleaning liquid collecting tank that collects the cleaning liquid overflowed from the reservoir tank; and    cleaning liquid circulating unit that circulates the cleaning liquid collected to the reservoir tank.    
     
     
         12 . The cleaning apparatus according to  claim 5 , further comprising: 
 a cleaning liquid collecting tank that collects the cleaning liquid overflowed from the reservoir tank; and    cleaning liquid circulating unit that circulates the cleaning liquid collected to the reservoir tank.    
     
     
         13 . The chemical processing apparatus according to  claim 6 , further comprising: 
 a cleaning liquid collecting tank that collects the cleaning liquid overflowed from the reservoir tank; and    cleaning liquid circulating unit that circulates the cleaning liquid collected to the reservoir tank.    
     
     
         14 . The method for manufacturing a circuit substrate according to  claim 8 , further comprising collecting the cleaning liquid or chemical in a cleaning liquid/chemical collecting tank.  
     
     
         15 . A transfer apparatus, comprising: 
 a reservoir tank that stores a fluid;    means for supplying the fluid into the reservoir tank such that the fluid overflows from the reservoir tank; and    means for transferring an object to be transferred while floating the object to be transferred on the fluid.    
     
     
         16 . A transfer apparatus, comprising: 
 a support member that supports an object to be transferred;    means for supplying a fluid on the support member such that the fluid flows along a transfer direction of the object to be transferred; and    means for transferring the object to be transferred while floating the object to be transferred on the fluid.    
     
     
         17 . A cleaning apparatus, comprising: 
 a reservoir tank that stores a cleaning liquid;    means for supplying the cleaning liquid into the reservoir tank such that the cleaning liquid overflows from the reservoir tank;    means for transferring an object to be transferred while floating the object to be transferred on the cleaning liquid; and    means for jetting the cleaning liquid on the object to be transferred that floats on the cleaning liquid.    
     
     
         18 . A cleaning apparatus, comprising: 
 a support member that supports an object to be transferred;    means for supplying a cleaning liquid on the support member such that the cleaning liquid flows along a transfer direction of the object to be transferred;    means for transferring the object to be transferred while floating the object to be transferred on the cleaning liquid; and    means for jetting the cleaning liquid on the object to be transferred that floats on the cleaning liquid.    
     
     
         19 . A chemical processing apparatus, comprising: 
 a reservoir tank that stores a chemical;    means for supplying the chemical into the reservoir tank such that the chemical overflows from the reservoir tank;    means for transferring an object to be transferred while floating the object to be transferred on the chemical; and    means for jetting the chemical on the object to be transferred that floats on the chemical.    
     
     
         20 . A chemical processing apparatus, comprising: 
 a support member that supports an object to be transferred;    means for supplying a chemical on the support member such that the chemical flows along a transfer direction of the object to be transferred;    means for transferring the object to be transferred while floating the object to be transferred on the chemical; and    means for jetting the chemical on the object to be transferred that floats on the chemical.

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