US2004259922A1PendingUtilityA1
Epothilone derivatives, a process for their production thereof and their use
Priority: May 8, 1998Filed: Feb 17, 2004Published: Dec 23, 2004
Est. expiryMay 8, 2018(expired)· nominal 20-yr term from priority
A61P 35/00C07D 493/04Y02P20/55
50
PatentIndex Score
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Claims
Abstract
The present invention relates to epothilon derivatives, processes for their production and their use in the manufacture of medicaments and plant protection agents.
Claims
exact text as granted — not AI-modified1 - 17 . (cancelled)
18 . A compound of formula:
wherein
R 1 is a H atom or a C 1 - to C 8 -alkyl group,
X-Y is a group of the formula —CH 2 CH(OP)— or —CH═CH—,
P is a protecting group, and
each R is independently a C 1 - to C 8 -alkyl group or a C 2 - to C 6 -alkenyl group.
19 . The compound of claim 18 wherein at least one R is a C 1 - to C 6 -alkyl group.
20 . The compound of claim 18 wherein at least one R is a C 1 - to C 4 -alkyl group.
21 . The compound of claim 18 wherein at least one R is a C 2 - to C 6 -alkenyl group.
22 . The compound of claim 18 wherein at least one R is a C 2 - to C 4 -alkenyl group.
23 . The compound of claim 18 wherein R 1 is a H atom or a C 1 - to C 6 -alkyl group.
24 . The compound of claim 18 wherein R 1 is a H atom or a methyl group.
25 . A process for preparing a compound of the formula
wherein
R 1 is a H atom or a C 1 - to C 8 -alkyl group,
X-Y is a group of the formula —CH 2 CH(OP)— or —CH═CH—,
P is a protecting group, and
each R is independently a C 1 - to C 8 -alkyl group or a C 2 - to C 6 -alkenyl group;
comprising: reacting a compound of the formula 2:
with a compound of the formula HC[B(OR) 2 ] 3 .
26 . The process according to claim 25 wherein the compound of the formula HC[B(OR) 2 ] 3 is tris(ethylenedioxyboryl)methane.
27 . The process according to claim 25 wherein the compound of the formula 2 and the compound of the formula HC[B(OR) 2 ] 3 are reacted in the presence of a strong base.
28 . The process according to claim 27 wherein the strong base is a C 1 -C 4 -alkyl lithium compound or a di-C 1 -C 4 -alkylamine lithium compound.
29 . The process according to claim 28 wherein the strong base is butyllithium or dimethylamine lithium compound.
30 . The process according to claim 25 wherein the compound of the formula II and the compound of the formula HC[B(OR) 2 ] 3 are reacted at a temperature of less than about −30° C.Join the waitlist — get patent alerts
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