US2004259922A1PendingUtilityA1

Epothilone derivatives, a process for their production thereof and their use

Priority: May 8, 1998Filed: Feb 17, 2004Published: Dec 23, 2004
Est. expiryMay 8, 2018(expired)· nominal 20-yr term from priority
A61P 35/00C07D 493/04Y02P20/55
50
PatentIndex Score
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Claims

Abstract

The present invention relates to epothilon derivatives, processes for their production and their use in the manufacture of medicaments and plant protection agents.

Claims

exact text as granted — not AI-modified
1 - 17 . (cancelled)  
     
     
         18 . A compound of formula:  
       
         
           
           
               
               
           
         
       
       wherein 
 R 1  is a H atom or a C 1 - to C 8 -alkyl group,  
 X-Y is a group of the formula —CH 2 CH(OP)— or —CH═CH—,  
 P is a protecting group, and  
 each R is independently a C 1 - to C 8 -alkyl group or a C 2 - to C 6 -alkenyl group.  
 
     
     
         19 . The compound of  claim 18  wherein at least one R is a C 1 - to C 6 -alkyl group.  
     
     
         20 . The compound of  claim 18  wherein at least one R is a C 1 - to C 4 -alkyl group.  
     
     
         21 . The compound of  claim 18  wherein at least one R is a C 2 - to C 6 -alkenyl group.  
     
     
         22 . The compound of  claim 18  wherein at least one R is a C 2 - to C 4 -alkenyl group.  
     
     
         23 . The compound of  claim 18  wherein R 1  is a H atom or a C 1 - to C 6 -alkyl group.  
     
     
         24 . The compound of  claim 18  wherein R 1  is a H atom or a methyl group.  
     
     
         25 . A process for preparing a compound of the formula  
       
         
           
           
               
               
           
         
         wherein 
 R 1  is a H atom or a C 1 - to C 8 -alkyl group,  
 X-Y is a group of the formula —CH 2 CH(OP)— or —CH═CH—,  
 P is a protecting group, and  
 each R is independently a C 1 - to C 8 -alkyl group or a C 2 - to C 6 -alkenyl group;  
 comprising: reacting a compound of the formula 2:  
                     
 with a compound of the formula HC[B(OR) 2 ] 3 .  
 
       
     
     
         26 . The process according to  claim 25  wherein the compound of the formula HC[B(OR) 2 ] 3  is tris(ethylenedioxyboryl)methane.  
     
     
         27 . The process according to  claim 25  wherein the compound of the formula 2 and the compound of the formula HC[B(OR) 2 ] 3  are reacted in the presence of a strong base.  
     
     
         28 . The process according to  claim 27  wherein the strong base is a C 1 -C 4 -alkyl lithium compound or a di-C 1 -C 4 -alkylamine lithium compound.  
     
     
         29 . The process according to  claim 28  wherein the strong base is butyllithium or dimethylamine lithium compound.  
     
     
         30 . The process according to  claim 25  wherein the compound of the formula II and the compound of the formula HC[B(OR) 2 ] 3  are reacted at a temperature of less than about −30° C.

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