Device for controlling an apparatus generating a charged particle beam

Abstract

A device for adjusting a beam of charged particles. The device includes an adjustment mechanism for storing desired characteristics for the beam, determining values of adjustment parameters of the apparatus according to its characteristics, storing these values, and giving these stored values to the adjustment parameters of the apparatus. The device can be applied in particular to the manufacturing of nanostructures.

1 - 10 . (Canceled).  
     
     
         11 . An adjustment device of an apparatus for generating a beam of charged particles, wherein the beam is configured to interact with a target, the device comprising: 
 means for adjusting for: 
 storing desired characteristics for the beam of charged particles, as determined by a user of the apparatus,  
 determining values of adjustment parameters of the apparatus according to the stored characteristics, and storing the values, and  
 giving the stored values to the adjustment parameters of the apparatus.  
   
     
     
         12 . The device according to  claim 11 , wherein the means for adjusting is further for: 
 continually or periodically measuring the parameters, when the beam of charged particles interacts with the target and determining the characteristics for the beam from the measurements,    comparing the determined characteristics with the stored characteristics, and    if at least one of the determined characteristics lies outside a predefined amplitude range, centered on the corresponding stored characteristic, changing the adjustment parameters of the apparatus and/or informing the user of the apparatus.    
     
     
         13 . The device according to  claim 11 , wherein the charged particles are ions, the target is a substrate, the apparatus comprises an ion source, means for accelerating the ions, and means for focusing the ions, and the apparatus is for manufacturing a structure on the substrate, the ion beam configured to erode the substrate, wherein the means for adjusting is for: 
 storing the desired characteristics for the ion beam, as determined by the user of the apparatus according to the structure to be manufactured,    determining the values of the adjustment parameters of the apparatus according to the stored characteristics and storing the values, and    giving the stored values to the adjustment parameters of the apparatus.    
     
     
         14 . The device according to  claim 13 , wherein the means for adjusting is further for: 
 continually or periodically measuring the parameters, during the manufacturing of the structure, and determining the characteristics of the beam from the measurements,    comparing the determined characteristics with the stored characteristics, and    if at least one of the determined characteristics lies outside a predefined amplitude range, centered on the corresponding stored characteristics, changing the adjustment parameters of the apparatus and/or informing the user of the apparatus.    
     
     
         15 . The device according to  claim 13 , wherein the characteristics of the ion beam comprise a size and current density of the ion beam.  
     
     
         16 . The device according to  claim 14 , wherein the characteristics of the ion beam comprise a size and current density of the ion beam.  
     
     
         17 . The device according to  claim 13 , wherein the means for adjusting is further for: 
 controlling the apparatus to form on the substrate, in an area of the substrate that is not for formation of the structure, a test imprint according to a stored reference digital imprint,    digitizing the test imprint,    comparing the digitized test imprint with the stored reference digital imprint, and    if the imprints are different, changing at least one of the adjustment parameters of the apparatus and repeating the controlling, digitizing, and comparing until a proper adjustment of the apparatus is obtained.    
     
     
         18 . The device according to  claim 13 , wherein the means for adjusting is further for: 
 measuring the adjustment parameters of the apparatus at any instant or periodically, during the manufacturing of the structure, and    if at least one of the parameters drifts and therefore leaves a predefined amplitude range, centered on the corresponding stored parameter, changing the measured parameter so that the measured parameter is again within the predefined range.    
     
     
         19 . The device according to  claim 13 , wherein the means for adjusting is further for: 
 measuring the adjustment parameters of the apparatus at any instant or periodically during manufacturing of the structure, and    in an event of instability of at least one of the parameters, interrupting the manufacturing process and informing the user and/or calibrating the apparatus to adjust the parameter again.    
     
     
         20 . The device according to  claim 19 , wherein the means for adjusting is provided for executing following operations to calibrate the apparatus: 
 controlling the apparatus to form on the substrate, in an area of the substrate that is not for formation of the structure, a test imprint according to a stored reference digital imprint,    digitizing the test imprint,    comparing the digitized test imprint with the stored reference digital imprint, and    if the imprints are different, changing the adjustment parameter of the apparatus and repeating the controlling, digitizing, and comparing until a proper adjustment of the apparatus is obtained.    
     
     
         21 . The device according to  claim 13 , wherein the adjustment parameters comprise an emission current of the ion source, an energy of the ions, a focusing of the ion beam, an amplitude of a writing field on the substrate, a correction of stigmatism, and a distance between the apparatus and the substrate.