Protective thin film for FPDs, method for producing said thin film and FPDs using said thin film
Abstract
The present invention provides a protecting film capable of preventing deterioration in adhesion and matching to a substrate (dielectric layer), and deterioration in electric insulation. The protecting film includes a film body composed of MgO or the like which is inhibited from reacting with CO 2 gas and H 2 O gas in air to prevent degeneration of MgO or the like into MgCO 3 and Mg(OH) 2 , etc. harmful to FPD. The film body is formed on the surface of the substrate, and the fluoride layer is formed on the surface of the film body. The fluoride layer is represented by MO X F Y (M is Mg, Ca, Sr, Ba, an alkali earth complex metal, a rare earth metal, or a complex metal of an alkali earth metal and a rare earth metal, 0≦X<2, and 0<Y≦4), and is obtained by reaction of a gaseous fluorinating agent with MgO or the like. As the gaseous fluorinating agent, a fluorine gas, a hydrogen fluoride gas, BF 3 , SbF 5 or SF 4 is preferably used.
Claims
exact text as granted — not AI-modified1 . (Canceled)
2 . A FPD protecting film comprising a film body comprising of any one of MgO, CaO, SrO, BaO, an alkali earth compound oxide, a rare earth oxide, and a compound oxide of alkali earth oxides and rare earth oxides, wherein the film body is present on the surface of a substrate and is formed from a fluoride layer-coated powder of any one of MgO, CaO, SrO, BaO, alkali earth compound oxides, rare earth oxides, and compound oxides of alkali earth oxides and rare earth oxides.
3 - 6 . (Canceled).
7 . A method of producing a FPD protecting film comprising:
forming a film body comprising any one of MgO, CaO, SrO, BaO, an alkali earth compound oxide, a rare earth oxide, and a compound oxide of alkali earth oxides and rare earth oxides on the surface of a substrate; and treating the surface of the film body with a gaseous fluorinating agent to form a fluoride layer on the surface of the film body.
8 . The method of producing a FPD protecting film according to claim 7 , comprising:
forming the film body on the surface of the substrate in a vacuum; and treating the surface of the film body with a gaseous fluorinating agent in a vacuum or an inert gas atmosphere without exposing the film body to air.
9 . The method of producing a FPD protecting film according to claim 7 , comprising:
forming the film body on the surface of the substrate in a vacuum; burning the film body in air to activate the film body after exposing it to air; and treating the surface of the film body with a gaseous fluorinating agent to form a fluoride layer on the surface of the film body.
10 . The method of producing a FPD protecting film according to claim 8 , further comprising
burning the film body in air before, during and after assembly of a panel using the substrate on the surface of which the film body and the fluoride layer are formed.
11 . A method of producing a FPD protecting film comprising:
treating the surfaces of a powder of any one of MgO, CaO, SrO, BaO, an alkali earth compound oxide, a rare earth oxide, and a compound oxide of alkali earth oxides and rare earth oxides, with a gaseous fluorinating agent to coat the powder with a fluoride layer to form a fluoride layer-coated powder; mixing the fluoride layer-coated powder, a binder, and a solvent to prepare paste or a dispersion for a film; and forming a film body on the surface of a substrate with the paste or dispersion for a film.
12 . The method of producing a FPD protecting film according to claim 7 , wherein the surface of the film body, or the surface of the powder is treated with the gaseous fluorinating agent at a pressure of 1 to 760 Torr.
13 . The method of producing a FPD protecting film according to claim 7 , wherein the gaseous fluorinating agent comprises at least one of a fluorine gas, a hydrogen fluoride gas, BF 3 , SbF 5 or SF 4 .
14 . The powder for producing a FPD protecting film according to claim 2 , which is coated with a fluoride layer.
15 . The powder according to claim 14 , wherein the thickness of the fluoride layer is 0.1 to 1000 nm.
16 . A paste for a film prepared by mixing a powder of any one of MgO, CaO, SrO, BaO, an alkali earth compound oxide, a rare earth oxide, and a compound oxide of alkali earth oxides and rare earth oxides, which is coated with a fluoride layer, according to claim 14 , a binder and a solvent.
17 : A dispersion for a film prepared by mixing a powder of any one of MgO, CaO, SrO, BaO, an alkali earth compound oxide, a rare earth oxide, and a compound oxide of alkali earth oxides and rare earth oxides, which is coated with a fluoride layer, according to claim 14 , a binder and a solvent.
18 . (Canceled).
19 . A method of producing a FPD protecting film comprising:
forming a protecting film comprising a powder of any one of MgO, CaO, SrO, BaO, an alkali earth compound oxide, a rare earth oxide, and a compound oxide of alkali earth oxides and rare earth oxides on a substrate; treating the surface of the protecting film with a gaseous fluorinating agent to form a fluoride layer on the surface of the protecting film; and removing the fluoride layer after a FPD is assembled with the substrate.
20 . The method of producing a FPD protecting film according to claim 19 , wherein the fluoride layer is represented by MO X F Y wherein M is Mg, Ca, Sr, Ba, an alkali earth complex metal, a rare earth metal, or a complex metal of an alkali earth metal and rare earth metal, 0≦X<2, and 0<Y≦4.
21 . The method of producing a FPD protecting film according to claim 19 , wherein the fluoride layer is obtained by reaction of a gaseous fluorinating agent with an alkali earth metal oxide, an alkali earth metal compound oxide, a rare earth metal oxide, or a compound oxide of an alkali earth metal and a rare earth metal.
22 . The method of producing a FPD protecting film according to claim 21 , wherein the gaseous fluorinating agent comprises any one of a fluorine gas a hydrogen fluoride gas, BF 3 , SbF 5 and SF 4 .
23 . The method of producing a FPD protecting film according to claim 19 , wherein the thickness of the fluoride layer is 0.1 to 1000 nm.
24 . A FPD protecting film produced by a method according to claim 19 .
25 . A FPD comprising a protecting film according to claim 24 .
26 . The method of producing a FPD protecting film according to claim 11 , wherein the surface of the film body, or the surface of the powder is treated with the gaseous fluorinating agent at a pressure of 1 to 760 Torr.
27 . The method of producing a FPD protecting film according to claim 11 , wherein the gaseous fluorinating agent comprises a fluorine gas, a hydrogen fluoride gas, BF 3 , SbF 5 or SF 4 .Join the waitlist — get patent alerts
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