US2004232535A1PendingUtilityA1
Microelectromechanical device packages with integral heaters
Priority: May 22, 2003Filed: May 22, 2003Published: Nov 25, 2004
Est. expiryMay 22, 2023(expired)· nominal 20-yr term from priority
Inventors:Terry Tarn
H10W 76/60H10W 74/00B81C 2203/0181G02B 26/08Y10T156/10B81C 1/00269G02B 26/0841
41
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Claims
Abstract
A microelectromechanical device package with integral a heater and a method for packaging the microelectromechanical device are disclosed in this invention. The microelectromechanical device package comprises a first package substrate and second substrate, between which a microelectromechanical device, such as a micromirror array device is located. In order to bonding the first and second package substrates so as to package the microelectromechanical device inside, a sealing medium layer is deposited, and heated by the heater so as to bond the first and second package substrates together.
Claims
exact text as granted — not AI-modifiedWe claim:
1 . A substrate of a package for packaging a micromirror array device, the substrate comprising:
a laminate that comprises a plurality of substrate layers bonded together; and a heater that is disposed along a periphery of one substrate layer of the plurality of substrate layers and disposed between said substrate layer and another substrate layer of the plurality of substrate layers.
2 . The substrate of claim 1 , wherein the heater has a zigzag shape.
3 . The substrate of claim 1 , wherein the substrate layers are ceramic.
4 . The substrate of claim 1 , wherein the substrate layers are glass.
5 . The substrate of claim 1 , wherein the heater comprises tungsten.
6 . The substrate of claim 1 , wherein the plurality of the substrate layers form a cavity in which the micromirror array device is located.
7 . The substrate of claim 6 , wherein one substrate layer of the plurality of substrate layers is deposited thereon a metallization layer for metalizing at least said substrate layer or a glass frit.
8 . The substrate of claim 7 , wherein the substrate layer, on which the metallization layer is deposited is the surface layer of the substrate.
9 . The substrate of claim 6 , wherein the laminate comprises an inlay glass that is transmissive to visible light.
10 . The substrate of claim 1 , wherein the laminate is a flat plate.
11 . A package, comprising:
a first substrate having a heater along a periphery of the top surface of the first substrate and underneath said top surface; a second substrate above the first substrate; a semiconductor device or a microelectromechanical system device between the first and second substrate; and a first sealing medium layer bonding the first substrate and the second substrate together.
12 . The package of claim 11 , wherein the first sealing medium layer further comprises a glass frit or solderable metallic material that bonds the first and second substrates together.
13 . The package of claim 11 , wherein the first substrate is a multilayered structure that comprises a plurality of substrate layers.
14 . The package of claim 11 , wherein the heater has a zigzag shape
15 . The package of claim 11 , wherein the heater comprises a metallic material.
16 . The package of claim 15 , wherein the metallic material of the heater is formed by sputtering.
17 . The package of claim 11 , wherein the microelectromechanical device is a micromirror array device that comprises an array of micromirrors for selectively reflecting light.
18 . The package of claim 11 , wherein the first substrate is ceramic.
19 . The package of claim 11 , wherein the second substrate is glass that is transparent to visible light.
20 . The package of claim 19 , wherein at least one surface of the second glass substrate is deposited thereon an anti-reflection layer for enhancing transmission of visible light through the glass substrate.
21 . The package of claim 11 , wherein the second substrate further comprises: another heater along a periphery of a surface of the second substrate and underneath said surface of the second substrate.
22 . The package of claim 11 , wherein the first sealing medium layer is a multilayered structure that further comprises a plurality of solderable metallization layers for metalizing the surface of the first substrate.
23 . The package of claim 11 , wherein the first sealing medium layer is a solderable metallization layer for metalizing the surface of the first substrate.
24 . The package of claim 23 , further comprising:
a metallic solder layer on the first sealing medium layer; and a second sealing medium layer that is solderable metallization layer between the metallic solder layer and the second substrate for metalizing a surface of the second substrate, said surface facing the micromirror array device within the cavity of the first substrate.
25 . The package of claim 11 , further comprises: one or more getters.
26 . The package of claim 11 , wherein the first substrate has a concave surface forming a cavity, in which the semiconductor or the microelectromechanical device is located.
27 . The package of claim 11 , wherein the first substrate is a flat plate, on which the semiconductor or the microelectromechanical device is located.
28 . The package of claim 27 , wherein the package further comprises: a spacer between the first and second substrate; and wherein the first sealing medium layer is between the spacer and the first substrate for bonding the first substrate and the spacer.
29 . The package of claim 28 , wherein the first sealing medium is a glass frit or a solderable metallic layer.
30 . The package of claim 29 , wherein the solderable metallic layer that further comprises a first metallization layer for metalizing the surface of the first substrate, a sealing medium layer for bonding the first substrate and the space together and a second metallization layer for metalizing the surface of the spacer.
31 . The package of claim 28 , wherein the package further comprises a second sealing medium layer between the spacer and the second substrate.
32 . The package of claim 31 , wherein the second sealing medium is a glass frit or a solderable metallization layer.
33 . The package of claim 32 , wherein the solderable metallic layer that further comprises a first metallization layer for metalizing the surface of the first substrate, a sealing medium layer for bonding the first substrate and the space together and a second metallization layer for metalizing the surface of the spacer.
34 . The package of claim 11 , wherein the micromirror array device is a part of a spatial light modulator used in a digital display system.
35 . The package of claim 11 , wherein the micromirror array device further comprises:
an array of micromirrors; and an array of electrodes and circuitry for electrostatically controlling the micromirrors.
36 . The package of claim 27 , wherein the micromirror array and the electrodes and circuitry array are formed on one device substrate.
37 . The package of claim 27 , wherein the micromirror array is formed on a glass substrate that is transparent to visible light; and wherein the electrodes and circuitry array is formed on a wafer.
38 . The package of claim 11 , further comprising: one or more getters.
39 . The package of claim 11 , wherein the first substrate has a concave surface that forms a cavity in which the semiconductor device or the microelectromechanical device being located
40 . A method comprising:
providing a first package substrate that comprises a heater integral with and along a periphery of one surface of the first substrate; attaching a semiconductor device or a microelectromechanical device to the first substrate; placing a second substrate on the first substrate with a first sealing medium layer therebetween; driving an electric current through the heater so as to generate heat for melting the first sealing medium; and bonding the first and second substrate by the melted sealing medium.
41 . The method of claim 40 , wherein the heater is embedded underneath the surface of the first substrate.
42 . The method of claim 40 , wherein the microelectromechanical device is a micromirror array device that comprises an array of micromirrors for selectively reflecting light.
43 . The method of claim 40 , wherein the heater is formed on the surface of the first substrate.
44 . The method of claim 40 , wherein the first substrate is a multilayered structure that further comprises a plurality of substrate layers.
45 . The method of claim 40 , wherein the heater is made up of tungsten.
46 . The method of claim 40 , wherein the heater has an zigzag edge.
47 . The method of claim 40 , wherein the first sealing medium is a glass frit.
48 . The method of claim 40 , wherein the first sealing medium is a solderable metallic layer.
49 . The method of claim 40 , wherein the first sealing medium is an inorganic material.
50 . The method of claim 49 , wherein the inorganic material is a metal oxide or metalloid oxide.
51 . The method of claim 49 , wherein the inorganic material is a metal.
52 . The method of claim 40 , further comprising:
placing the semiconductor device or the microelectromechanical device into a cavity defined by the first substrate; and depositing an anti-stiction material within the cavity.
53 . The method of claim 52 , wherein the second sealing medium layer is a solderable metallization layer.
54 . The method of claim 52 , further comprising:
forming another heater on in the second substrate such that the heater is along a periphery of one surface of the second substrate; driving another electric current through the heater on the second substrate.
55 . The method of claim 54 , wherein the heater in the second substrate is embedded underneath the surface, along the periphery of which the heater is formed.
56 . The method of claim 55 , wherein the heater is made up of tungsten.
57 . The method of claim 55 , wherein the heater has a zigzag shape.
58 . The method of claim 55 , wherein the second substrate is a multilayered structure that further comprises a plurality of layers.
59 . The method of claim 54 , wherein the first sealing medium layer further comprises:
a plurality of solderable metallization layers.
60 . The method of claim 40 , further comprising:
during driving the electric current through the heater in the first substrate, applying a pressure on the first and second substrate so as to bonding the first and second substrate.
61 . The method of claim 40 , wherein the first substrate has a concave surface that forms a cavity, in which the semiconductor device or the microelectromechanical device is placed.
62 . The method of claim 40 , wherein the second substrate comprises an inlay glass window that is transparent to visible light.
63 . The method of claim 40 , further comprising:
depositing a rectangular light blocking frame along the circumference of the second substrate before bonding the first and the second substrate.
64 . The method of claim 40 , wherein the first substrate is flat; and wherein the method further comprises:
before bonding the first and second substrate,
placing a spacer on the deposited first sealing medium layer and between the first and second substrate; and
depositing a second sealing medium layer between the spacer and the second substrate.
65 . The method of claim 64 , wherein the second sealing medium layer is a glass frit.
66 . The method of claim 64 , wherein the second sealing medium layer is a solderable metallic material.
67 . The method of claim 64 , wherein the second substrate further comprises another heater formed along a periphery of one surface of the second substrate and embedded underneath said surface of the second substrate.
68 . The method of claim 67 , further comprising:
driving another electric current through the heater in the second substrate.
69 . The method of claim 64 , further comprising:
depositing a first metallization layer on a surface of the spacer between the spacer and the second substrate for metalizing the surface of the spacer; depositing a solder layer between the first metallization layer and the second substrate; and depositing a second metallization layer along a lower surface of the second substrate, said lower surface of the second substrate facing the solder layer and the first substrate.
70 . The method of claim 69 , wherein the first or second metallization layer is a multilayered structure.
71 . The method of claim 40 , further comprising:
providing a light source for emitting light shining on the micromirror array device; providing a condensing optic element along a path of the light emitted from the light source and shining on the micromirror array device for directing the light onto the micromirror array device; selectively reflecting the light, by the micromirrors of the micromirror array device, onto a display target and; providing a projection optic element along a path of the reflected light towards the display target.
72 . The method of claim 40 , wherein the step of driving the electric current through the heater further comprises:
driving the electric current through the heater so as to heat the surface of the first substrate around 300° degrees or more.
73 . The method of claim 40 , wherein the step of driving the electric current through the heater further comprises:
driving the electric current through the heater so as to heat the surface of the first substrate around 200° degrees or more.
74 . The method of claim 40 , wherein the step of driving the electric current through the heater further comprises:
driving the electric current through the heater so as to heat the first sealing medium to a temperature from 100° to 300° degrees.
75 . The method of claim 40 , wherein the first sealing medium has a melting temperature around 300° degrees or less.
76 . The method of claim 40 , wherein the first sealing medium has a melting temperature around 200° degrees or less.
77 . The method of claim 40 , wherein the semiconductor and the electromechanical device is at a location having a temperature around 70° degrees or less when driving the electric current through the heater.
78 . A system, comprising:
a light source for providing light; a spatial light modulator for selectively modulating light from the light source so as to form an image on a display target, wherein the spatial light modulator further comprises:
a first package substrate having a heater along a periphery of the top surface of the first package substrate and embedded underneath said top surface for generating heat;
a micromirror array device held on the first package substrate;
a second package substrate on the first package substrate; and
a first sealing medium layer bonding the first package substrate and the second package substrate together;
a condensing optical element for directing the incident light onto the spatial light modulator; a display target; and a projection optic element for directing the modulated light onto the display target.
79 . The system of claim 78 , further comprising:
a color wheel having at least three color regions, each corresponding to one of the three primary colors including red, blue and green.
80 . The system of claim 78 , wherein the first package substrate has a concave surface that forms a cavity, in which the micromirror array device is located.
81 . The system of claim 78 , wherein the first package substrate further comprises a plurality of substrate layers.
82 . The system of claim 78 , wherein the first package substrate is ceramic.
83 . The system of claim 78 , wherein the heater in the first package substrate has a zigzag shape.
84 . The system of claim 78 , wherein the first sealing medium layer is a glass frit.
85 . The system of claim 78 , wherein the heater in the first package substrate is tungsten.
86 . The system of claim 78 , wherein the second substrate is glass that is transparent to visible light.
87 . The system of claim 86 , wherein the glass substrate is coated with an anti-reflection layer for enhancing transmission of incident light through the glass substrate.
88 . The system of claim 78 , wherein the second package substrate further comprises another heater along a periphery of one surface of the second package substrate and embedded underneath said surface of the second package substrate.
89 . The system of claim 78 , wherein the micromirror array device further comprises:
an array of micromirrors for selectively reflecting the incident light; and an array of electrodes and circuitry for electrostatically controlling the micromirrors.
90 . The system of claim 89 , wherein the array of micromirrors and the array of electrodes and circuitry are formed on one device substrate;
91 . The system of claim 90 , wherein the array of micromirrors and the array of electrodes and circuitry are formed on separate device substrates.
92 . The system of claim 78 , wherein the spatial light modulator further comprises:
a soldering layer deposited on the first sealing medium; and a second sealing medium deposited on the soldering layer.
93 . The system of claim 92 , wherein the first sealing medium layer is a solderable metallization layer for metalizing the surface of the first package substrate; and wherein the second sealing medium is a solderable metallization layer for metalizing the surface of the second package substrate.
94 . The system of claim 93 , wherein the first or the second sealing medium layer is a multilayered structure.Join the waitlist — get patent alerts
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