Multilayer coating package on flexible substrates for electro-optical devices

Abstract

An electro-optical device having at least one base and a multilayer coating surface disposed on at least one surface of the base. The at least one base may comprise either an optically or electronically active portion or a flexible polymeric material. The multilayer coating set comprises at least one organic layer and at least one inorganic layer. The base and multilayer coating set are transparent. The multilayer coating set provides a barrier to moisture and oxygen and provides chemical resistance. The multilayer coating set is also mechanically flexible and thermally stable up to a glass transition temperature of the base.

1 . An electro-optical device, said electro-optical device comprising: 
 a) at least one base, said at least one base comprising a flexible polymeric material; and    b) a multilayer coating set disposed on at least one surface of said base, said multilayer coating set comprising at least one organic layer and at least one inorganic layer,    wherein said base and multilayer coating set are transparent, and wherein said multilayer coating set provides a barrier to moisture and oxygen, provides chemical resistance, and wherein said multilayer coating set is mechanically flexible and thermally stable up to a glass transition temperature of said base.    
     
     
         2 . The electro-optical device according to  claim 1 , wherein said multilayer coating set is deposited on said at least one surface by a vacuum deposition technique.  
     
     
         3 . The electro-optical device according to  claim 2 , wherein said at least one inorganic layer is deposited by one of plasma deposition and physical vapor deposition.  
     
     
         4 . The electro-optical device according to  claim 3 , wherein said at least one inorganic layer is deposited by one of plasma enhanced chemical vapor deposition, expanding thermal plasma, microwave plasma, inductively coupled plasma, and high density plasma chemical vapor deposition.  
     
     
         5 . The electro-optical device according to  claim 3 , wherein said at least one inorganic layer is deposited by one of sputtering, laser ablation, cathodic arc deposition, and electron beam evaporation.  
     
     
         6 . The electro-optical device according to  claim 3 , wherein said at least one organic layer is deposited by one of plasma deposition, physical vapor deposition, and polymer monolithic layer deposition.  
     
     
         7 . The electro-optical device according to  claim 6 , wherein said at least one organic layer is deposited by one of plasma enhanced chemical vapor deposition, expanding thermal plasma, microwave plasma, inductively coupled plasma, and high density plasma chemical vapor deposition.  
     
     
         8 . The electro-optical device according to  claim 6 , wherein said at least one organic layer is deposited by one of sputtering, laser ablation, cathodic arc deposition, and electron beam evaporation.  
     
     
         9 . The electro-optical device according to  claim 6 , wherein said at least one organic layer is deposited by polymer monolithic layer deposition, wherein polymer monolithic layer deposition comprises the steps of flash evaporation of at least one radiation-curable acrylic monomer, condensation of said at least one monomer, and radiational cross-linking of said at least one monomer to form said at least one organic layer.  
     
     
         10 . The electro-optical device according to  claim 1 , wherein said flexible polymeric material comprises a polycarbonate.  
     
     
         11 . The electro-optical device according to  claim 1 , wherein said at least one organic layer comprises at least one of a parylene, an acrylic, a siloxane, xylene, an alkene, styrene, an organosilane, an organosilazane, and an organosilicone.  
     
     
         12 . The electro-optical device according to  claim 1 , wherein said at least one organic layer includes at least one of an adhesion layer, a stress relief layer, a conformal layer, a chemically resistant layer, and an abrasion resistant layer, and combinations thereof.  
     
     
         13 . The electro-optical device according to  claim 12 , wherein said chemically resistant layer is resistant to at least one of alkali solutions, acids, and organic solvents.  
     
     
         14 . The electro-optical device according to  claim 1 , wherein said at least one inorganic layer comprises at least one of a metal oxide, a metal nitride, silicon oxide, silicon nitride, and combinations thereof.  
     
     
         15 . The electro-optical device according to  claim 14 , wherein said at least one inorganic layer comprises at least one of indium zinc oxide, indium tin oxide, silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, aluminum nitride, aluminum oxynitride, zinc oxide, indium oxide, tin oxide, cadmium tin oxide, cadmium oxide, and magnesium oxide.  
     
     
         16 . The electro-optical device according to  claim 1 , wherein said at least one inorganic layer includes at least one of an ultraviolet radiation absorbent layer, an infrared radiation absorbent layer, a barrier layer, an electrically conductive layer, an anti-reflective layer, and combinations thereof.  
     
     
         17 . The electro-optical device according to  claim 16 , wherein said moisture barrier layer has a water vapor transmission rate of less than 0.1 g/m 2 -day at 100% relative humidity and 25° C.  
     
     
         18 . The electro-optical device according to  claim 16 , wherein said oxygen barrier layer has an oxygen transmission rate of less than 0.1 cc/m 2 -day for oxygen diffusion in a 21% oxygen atmosphere at 25° C.  
     
     
         19 . The electro-optical device according to  claim 1 , wherein said multilayer coating set has a thickness from about 0.05 micron to about 50 microns.  
     
     
         20 . The electro-optical device according to  claim 19 , wherein said multilayer coating set has a thickness from about 0.1 micron to about 10 microns.  
     
     
         21 . The electro-optical device according to  claim 1 , wherein said electro-optical device is one of an electrochromic device, a liquid crystal display, an organic light emitting diode, a light-emitting diode, a photovoltaic device, and an x-ray detector.  
     
     
         22 . The electro-optical device according to  claim 1 , wherein said multilayer coating set further includes a transparent inorganic conductive layer.  
     
     
         23 . The electro-optical device according to  claim 22 , wherein said transparent inorganic conductive layer comprises indium tin oxide.  
     
     
         24 . A multilayer coating set for an electro-optical device, said multilayer coating set comprising: 
 a) at least one inorganic layer; and    b) at least one organic layer adjacent to said at least one inorganic layer,    wherein said multilayer coating set is transparent, and wherein said multilayer coating set provides a barrier to moisture and oxygen for said electro-optical device, provides resistance for said electro-optical device and for said base material during fabrication of said electro-optical device to chemical attack, is mechanically flexible and thermally stable.    
     
     
         25 . The multilayer coating set according to  claim 24 , wherein said multilayer coating set is deposited on said at least one surface of the base material by a vacuum deposition technique.  
     
     
         26 . The multilayer coating set according to  claim 24 , wherein said at least one inorganic layer is deposited by one of plasma deposition and physical vapor deposition.  
     
     
         27 . The multilayer coating set according to  claim 24 , wherein said at least one inorganic layer is deposited by one of plasma enhanced chemical vapor deposition, expanding thermal plasma, microwave plasma, inductively coupled plasma, and high density plasma chemical vapor deposition.  
     
     
         28 . The multilayer coating set according to  claim 24 , wherein said at least one inorganic layer is deposited by one of sputtering, laser ablation, cathodic arc deposition, and electron beam evaporation.  
     
     
         29 . The multilayer coating set according to  claim 24 , wherein said at least one organic layer is deposited by one of plasma deposition, physical vapor deposition, and polymer monolithic layer deposition.  
     
     
         30 . The multilayer coating set according to  claim 29 , wherein said at least one organic layer is deposited by one of plasma enhanced chemical vapor deposition, expanding thermal plasma, microwave plasma, inductively coupled plasma, and high density plasma chemical vapor deposition.  
     
     
         31 . The multilayer coating set according to  claim 29 , wherein said at least one organic layer is deposited by one of sputtering, laser ablation, cathodic arc deposition, and electron beam evaporation.  
     
     
         32 . The multilayer coating set according to  claim 29 , wherein said at least one organic layer is deposited by polymer monolithic layer deposition, wherein polymer monolithic layer deposition comprises the steps of flash evaporation of at least one radiation-curable acrylic monomer, condensation of said at least one monomer, and radiational cross-linking of said at least one monomer to form said at least one organic layer.  
     
     
         33 . The multilayer coating set according to  claim 24 , wherein said at least one organic layer comprises at least one of a parylene, an acrylic, a siloxane, xylene, an alkene, styrene, an organosilane, an organosilazane, and an organosilicone.  
     
     
         34 . The multilayer coating set according to  claim 24 , wherein said at least one organic layer includes at least one of an adhesion layer, a stress relief layer, a conformal layer, a chemically resistant layer, and an abrasion resistant layer, and combinations thereof.  
     
     
         35 . The multilayer coating set according to  claim 34 , wherein said chemically resistant layer is resistant to at least one of alkali solutions, acids, and organic solvents.  
     
     
         36 . The multilayer coating set according to  claim 24 , wherein said at least one inorganic layer comprises at least one of a metal oxide, a metal nitride, silicon oxide, silicon nitride, and combinations thereof.  
     
     
         37 . The electro-optical device according to  claim 36 , wherein said at least one inorganic layer comprises at least one of indium zinc oxide, indium tin oxide, silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, aluminum nitride, aluminum oxynitride, zinc oxide, indium oxide, tin oxide, cadmium tin oxide, cadmium oxide, and magnesium oxide.  
     
     
         38 . The multilayer coating set according to  claim 24 , wherein said at least one inorganic layer includes at least one of an ultraviolet radiation absorbent layer, an infrared radiation absorbent layer, a barrier layer, an electrically conductive layer, an anti-reflective layer, and combinations thereof.  
     
     
         39 . The multilayer coating set according to  claim 38 , wherein said moisture barrier layer has a water vapor transmission rate of less than 0.1 g/m 2 -day at 100% relative humidity and 25° C.  
     
     
         40 . The multilayer coating set according to  claim 38 , wherein said oxygen barrier layer has an oxygen transmission rate of less than 0.1 cc/m 2 -day for oxygen diffusion in a 21% oxygen atmosphere at 25° C.  
     
     
         41 . The multilayer coating set according to  claim 24 , wherein said coating set has a thickness from about 0.05 micron to about 50 microns.  
     
     
         42 . The multilayer coating set according to  claim 41 , wherein said coating set has a thickness from about 0.1 micron to about 10 microns.  
     
     
         43 . An electro-optical device, said electro-optical device comprising at least one substrate, said substrate comprising: 
 a) at least one base, said at least one base comprising a flexible polymeric material; and    b) a multilayer coating set comprising at least one inorganic layer and at least one organic layer adjacent to said at least one inorganic layer, wherein said multilayer coating set is deposited on said at least one surface by a vacuum deposition technique, wherein said multilayer coating set is transparent, and wherein said multilayer coating set provides a barrier to moisture and oxygen for said electro-optical device, provides resistance for said electro-optical device to chemical attack, is mechanically flexible and thermally stable up to a glass transition temperature of said base.    
     
     
         44 . The electro-optical device according to  claim 43 , wherein said at least one inorganic layer is deposited by one of plasma deposition and physical vapor deposition.  
     
     
         45 . The electro-optical device according to  claim 44 , wherein said at least one inorganic layer is deposited by one of plasma enhanced chemical vapor deposition, expanding thermal plasma, microwave plasma, inductively coupled plasma, and high density plasma chemical vapor deposition.  
     
     
         46 . The electro-optical device according to  claim 44 , wherein said at least one inorganic layer is deposited by one of sputtering, laser ablation, and electron beam evaporation.  
     
     
         47 . The electro-optical device according to  claim 44 , wherein said at least one organic layer is deposited by one of plasma deposition, physical vapor deposition, and polymer monolithic layer deposition.  
     
     
         48 . The electro-optical device according to  claim 47 , wherein said at least one organic layer is deposited by one of plasma enhanced chemical vapor deposition, expanding thermal plasma, microwave plasma, inductively coupled plasma, and high density plasma chemical vapor deposition.  
     
     
         49 . The electro-optical device according to  claim 47 , wherein said at least one organic layer is deposited by one of sputtering, laser ablation, and electron beam evaporation.  
     
     
         50 . The electro-optical device according to  claim 47 , wherein said at least one organic layer is deposited by polymer monolithic layer deposition, wherein polymer monolithic layer deposition comprises the steps of flash evaporation at least one radiation-curable acrylic monomer, condensation of said at least one monomer, and radiational cross-linking of said at least one monomer to form said at least one organic layer.  
     
     
         51 . The electro-optical device according to  claim 43 , wherein said flexible polymeric material comprises a polycarbonate.  
     
     
         52 . The electro-optical device according to  claim 43 , wherein said at least one organic layer comprises at least one of a parylene, an acrylic, a siloxane, xylene, an alkene, styrene, an organosilane, an organosilazane, and an organosilicone.  
     
     
         53 . The electro-optical device according to  claim 43 , wherein said at least one organic layer includes at least one of an adhesion layer, a stress relief layer, a conformal layer, a chemically resistant layer, and an abrasion resistant layer, and combinations thereof.  
     
     
         54 . The electro-optical device according to  claim 53 , wherein said chemically resistant layer is resistant to at least one of alkali solutions, acids, and organic solvents.  
     
     
         55 . The electro-optical device according to  claim 43 , wherein said at least one inorganic layer comprises at least one of a metal oxide, a metal nitride, silicon oxide, silicon nitride, and combinations thereof.  
     
     
         56 . The electro-optical device according to  claim 55 , wherein said at least one inorganic layer comprises at least one of indium zinc oxide, indium tin oxide, silicon oxide, silicon nitride, silicon oxynitride, aluminum oxide, aluminum nitride, aluminum oxynitride, zinc oxide, indium oxide, tin oxide, cadmium tin oxide, cadmium oxide, and magnesium oxide.  
     
     
         57 . The electro-optical device according to  claim 43 , wherein said at least one inorganic layer includes at least one of an ultraviolet radiation absorbent layer, an infrared radiation absorbent layer, a barrier layer, an electrically conductive layer, an anti-reflective layer, and combinations thereof.  
     
     
         58 . The electro-optical device according to  claim 57 , wherein said moisture barrier layer has a water vapor transmission rate of less than 0.1 g/m 2 -day at 100% relative humidity and 25° C.  
     
     
         59 . The electro-optical device according to  claim 57 , wherein said oxygen barrier layer has an oxygen transmission rate of less than 0.1 cc/m 2 -day for oxygen diffusion in a 21% oxygen atmosphere at 25° C.  
     
     
         60 . The electro-optical device according to  claim 43 , wherein said multilayer coating set has a thickness from about 0.05 micron to about 50 microns.  
     
     
         61 . The electro-optical device according to  claim 60 , wherein said multilayer coating set has a thickness from about 0.1 micron to about 10 microns.  
     
     
         62 . The electro-optical device according to  claim 43 , wherein said electro-optical device is one of an electrochromic device, a liquid crystal display, an organic light emitting diode, a light emitting diode, a photovoltaic device, and an x-ray detector.  
     
     
         63 . The electro-optical device according to  claim 43 , wherein said multilayer coating set further includes a transparent inorganic conductive layer.  
     
     
         64 . The electro-optical device according to  claim 63 , wherein said transparent inorganic conductive layer comprises indium tin oxide.