US2004212111A1PendingUtilityA1
Method of manufacturing a replica as well as a replica obtained by carrying out an UV light-initiated cationic polymerization
Priority: Jul 19, 2000Filed: May 17, 2004Published: Oct 28, 2004
Est. expiryJul 19, 2020(expired)· nominal 20-yr term from priority
C08L 63/00G11B 7/22B29L 2011/0016B29C 43/02C08G 65/18C08G 65/105B29D 11/00
48
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Claims
Abstract
The invention relates to a method of manufacturing a replica, which method comprises the provision of a bondable resin composition between a mold and a substrate or a blank, carrying out a curing treatment and removing the replica thus manufactured from the mold, which replica comprises the substrate and the reproduction of the mold provided thereon. The invention further relates to a replica obtained by carrying out a UV light-initiated cationic polymerization.
Claims
exact text as granted — not AI-modified1 - 5 . (canceled).
6 . A replica obtained by carrying out a UV light-initiated cationic polymerization of a compound comprising at least two cationically polymerizable cyclic ether groups, which compound only exhibits gelation when at least 50% of the conversion that can be achieved in the mold under the relevant curing conditions has taken place, if necessary in the presence of a reactive diluent.
7 . A replica as claimed in claim 6 , characterized in that this replica comprises a relief structure on at least one side, which relief structure must meet high (sub-micron) requirements with a view to the necessary accuracy of form.
8 . A replica as claimed in claim 6 , characterized in that the replica obtained is an optical component.
9 . A replica as claimed in claim 8 , characterized in that the optical component obtained is an (a) spherical lens, a lens array, a prism, a grating or another relief structure for optical applications, or a combination thereof.
10 . A replica as claimed in claim 7 , characterized in that the compound is represented by the following general formula I:
wherein:
Y=—O—, —SO 2 —, —CH 2 —, —C(CF 3 ) 2 —, —C(CH 3 ) 2 —,
X=a halogen or CH 3 ,
R 1 =—CH 2 —, —C(CH 3 ) 2 —,
R 2 =—OCH 2 CH 2 —, —OCCH 3 HCH 2 —, —OCH 2 CCH 3 H—, —OCH 2 CHOHCH 2 —,
R 3 =H, C n H 2n+1 ,
n=an integer≧1,
p=1-4,
m, a, b, c are each individual integers in the range from 0-4.
11 . A replica as claimed in claim 8 , characterized in that the compound is selected from the group formed by 1,2,7,8-diepoxyoctane, 3,4-epoxycyclohexylmethyl-3′,4′-epoxycyclohexanecarboxylate, bis(3,4-epoxycyclohexylmethyl)adipate, bis(3,4-epoxy-6-methylcyclohexyl-methyl)adipate and C12-C14-alkylglycidylether and the corresponding oxetane compounds thereof, in particular 1,4-bis[(3-ethyl-3-oxetanylmethoxy)methyl]benzene.
12 . A replica as claimed in claim 9 , characterized in that for the reactive diluent use is made of a compound selected from the group formed by butylglycidylether, heptylglycidylether, octylglycidylether, allylglycidylether, p-t-butylphenylglycidylether, phenylglycidylether, cresylglycidylether, diglycidylether of 1,4-butanediol, diglycidylether of neopentylglycol, diglycidylether of polypropeneglycol, vinylcyclohexanedioxide, diglycidylether of recorcinol, diglycidylether of polypropeneglycol and diglycidylester of linoleic acid dimer and the corresponding oxetane compounds thereof.Join the waitlist — get patent alerts
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