US2004209481A1PendingUtilityA1
Surface treating for micromachining and surface treatment method
Priority: Feb 27, 1998Filed: May 12, 2004Published: Oct 21, 2004
Est. expiryFeb 27, 2018(expired)· nominal 20-yr term from priority
H10P 14/69215H10P 14/6923H10P 14/6336H10P 14/6334H10P 14/6309H10P 50/283H10W 20/081H10P 70/234H10P 14/6922
41
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Claims
Abstract
The present invention provides a micromachining surface treatment material for and a surface treatment method that suppress widening of the diameter of contact holes when removing a natural oxidation layer arising at bottom sections of the contact holes. The micromachining surface treatment material contains less than 0.1% hydrofluoric acid, and more than 40% by weight but less than or equal to 47% by weight of ammonium fluoride. Also, a surfactant is contained therein in an amount from 0.0001 to 0.1 % by weight.
Claims
exact text as granted — not AI-modified1 . A micromacing surface treatment material containing less than 0.1% hydrofluoric acid, and more than 40% by weight, but less than or equal to 47% by weight of ammonium fluoride.
2 . THe micromachining surface treatment material of claim 1 , manufactured by dissolving ammonia gas in a hydrofluoric acid solution.
3 . THe micromachining surface treatment material of claim 1 , containing a surfactant at 0.0001 to 1% by weight.
4 . The micromachining surface treatment material of claim 3 , said surfactant is one of, or two more of, a fatty amine (C n H 2n+1 NH 2 ; n=7 to 14), a fatty carboxylic acid (C n H 2n+1 COOH; n=5 to 11), or a fatty alcohol (C n H 2n+1 OH; n=6 to 12).
5 . A surface treatment method that removes a natural oxidation layer inside contact holes using the micromachining surface treatment material of claim 1 .
6 . The surface treatment method of claim 5 , wherein the contact holes open to an oxidation film. oxide film is formed by CVD.
7 . The surface treatment method of claim 5 , wherein the oxidation film is a TEOS type oxidation film.Join the waitlist — get patent alerts
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