Mold structures, and method of transfer of fine structures

Abstract

A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.

What is claimed is:  
     
         1 . A nanoprint mold for forming a fine structure on a substrate with the use of a press machine, said mold comprising a release mechanism.  
     
     
         2 . The nanoprint mold according to  claim 1 , wherein said mold is provided with a curved surface on the side thereof on which a concave-convex pattern is formed.  
     
     
         3 . The nanoprint mold according to  claim 2 , wherein a portion of a periphery portion of said mold on the side where the concave-convex pattern is formed is inclined such that a center portion of the substrate has a large thickness.  
     
     
         4 . The nanoprint mold according to  claim 2 , wherein a portion of a periphery portion of said mold on the side on which the concave-convex pattern is formed is inclined such that a center portion of the substrate has a small thickness.  
     
     
         5 . The nanoprint mold according to  claim 2 , wherein the side of said mold on which the concave-convex pattern is formed is provided with a curved surface and is also provided with a deep groove at a portion thereof.  
     
     
         6 . The nanoprint mold according to  claim 1 , wherein said press machine comprises a heating and pressing mechanism.  
     
     
         7 . The nanoprint mold according to  claim 1 , wherein said mold has a light-transmitting property.  
     
     
         8 . The nanoprint mold according to  claim 1 , wherein said mold is flexible.  
     
     
         9 . The nanoprint mold according to  claim 8 , wherein said mold is secured to a supporter via an elastomer.  
     
     
         10 . The nanoprint mold according to  claim 9 , wherein said supporter comprises a rectangular, square, circular or elliptical frame structure.  
     
     
         11 . The nanoprint mold according to  claim 1 , wherein said mold is provided with an elastomer at an edge of the side of said mold on which the concave-convex pattern is formed, said elastomer facilitating the release of said mold from said substrate.  
     
     
         12 . A pattern transfer method for forming a fine structure on a substrate with the use of a press machine and a nanoprint mold, wherein said mold comprises a release mechanism.  
     
     
         13 . The pattern transfer method according to  claim 12 , wherein said mold is provided with a curved surface on the side thereof on which a concave-convex pattern is formed.  
     
     
         14 . The pattern transfer method according to  claim 13 , wherein a portion of a periphery portion of said mold on the side where the concave-convex pattern is formed is inclined such that a center portion of the substrate has a large thickness.  
     
     
         15 . The pattern transfer method according to  claim 13 , wherein a portion of a periphery portion of said mold on the side on which the concave-convex pattern is formed is inclined such that a center portion of the substrate has a small thickness.  
     
     
         16 . The pattern transfer method according to  claim 13 , wherein the side of said mold on which the concave-convex pattern is formed is provided with a curved surface and is also provided with a deep groove at a portion thereof.  
     
     
         17 . The pattern transfer method according to  claim 12 , wherein a pattern is transferred by heating and thereby deforming a resin substrate or a resin film on a substrate.  
     
     
         18 . The pattern transfer method according to  claim 12 , wherein a pattern is transferred by pressing and molding a resin substrate or a resin film on a substrate and then photo-curing said resin substrate or resin film.  
     
     
         19 . The pattern transfer method according to  claim 12 , wherein a pattern is transferred by irradiating a resin substrate or a resin film on a substrate with light from above a transparent mold such that said resin substrate or resin film is photo-cured.  
     
     
         20 . The pattern transfer method according to  claim 12 , wherein said mold is flexible.  
     
     
         21 . The pattern transfer method according to  claim 20 , wherein said mold is secured to a supporter via an elastomer.  
     
     
         22 . The pattern transfer method according to  claim 21 , wherein said supporter comprises a rectangular, square, circular or elliptical frame structure.  
     
     
         23 . The pattern transfer method according to  claim 12 , wherein said mold is provided with an elastomer at an edge of the side of said mold on which the concave-convex pattern is formed, said elastomer facilitating the release of said mold from said substrate.