ARC detection approach
Abstract
An apparatus and technique are provided for generating a plasma using a power supply circuit and arc detection arrangement. The power supply circuit has a cathode enclosed in a chamber, and is adapted to generate a power-related parameter. The arc detection arrangement is communicatively coupled to the power supply circuit and adapted to assess the severity of arcing in the chamber by comparing the power-related parameter to at least one threshold. According to various implementations, arc occurrences, arcing duration, intensity and/or energy are measured responsive to comparing the power-related parameter to the at least one threshold. According to further implementations, the above-mentioned measured quantities are accumulated and/or further processed.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A plasma generation apparatus, comprising:
a power supply circuit having a cathode enclosed in a chamber, and adapted to generate a power-related parameter; and an arc detection arrangement communicatively coupled to the power supply circuit and adapted to assess the severity of arcing in the chamber by comparing the power-related parameter to at least one threshold.
2 . The apparatus of claim 1 , wherein the arc detection arrangement is further adapted to measure arcing duration responsive to comparing the power-related parameter to the at least one threshold.
3 . The apparatus of claim 1 , wherein the arc detection arrangement is further adapted to measure cumulative arcing duration responsive to comparing the power-related parameter to at least one threshold.
4 . The apparatus of claim 1 , wherein the arc detection arrangement is further adapted to measure arcing intensity responsive to comparing the power-related parameter to at least one threshold.
5 . The apparatus of claim 4 , wherein the arc detection arrangement is further adapted to measure arcing duration responsive to comparing the power-related parameter to at least one threshold.
6 . The apparatus of claim 5 , wherein the arc detection arrangement is further adapted to measure arcing energy responsive to comparing the power-related parameter to at least one threshold.
7 . The apparatus of claim 5 , wherein the arc detection arrangement is further adapted to measure cumulative arcing energy responsive to comparing the power-related parameter to at least one threshold.
8 . The apparatus of claim 1 , wherein the arc detection arrangement is further adapted to assess the severity of arcing as a function of a product of arcing intensity and arcing duration.
9 . The apparatus of claim 1 , wherein the arc detection arrangement is further adapted to assess the severity of arcing as a function of a sum of products of arcing intensity and arcing duration.
10 . The apparatus of claim 1 , wherein at least one threshold is programmable via a logic arrangement coupled to the arc detection arrangement.
11 . The apparatus of claim 1 , wherein at least one threshold is programmable responsive to a non-arcing value of the power-related parameter.
12 . The apparatus of claim 1 , wherein the arc detection arrangement is adapted to digitize the power-related parameter before comparing to the at least one threshold.
13 . The apparatus of claim 1 , further comprising a logic arrangement communicatively coupled to the arc detection arrangement, and adapted to process digital information representative of arcing transmitted from the arc detection arrangement.
14 . The apparatus of claim 13 , wherein the logic arrangement is a programmable logic controller.
15 . An apparatus for assess arcing severity in a plasma generation chamber, comprising:
means for determining arc intensity by comparing a power-related parameter to at least one arc intensity threshold; means for timing an arc duration responsive to comparing the power-related parameter to the at least one arc intensity threshold; means for computing arc energy as a function of arc intensity and arc duration; and means for adding the arc energy to an accumulated arcing energy.Join the waitlist — get patent alerts
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