US2004171185A1PendingUtilityA1

Particle filter for partially enclosed microelectromechanical systems

Priority: Aug 20, 2002Filed: Mar 2, 2004Published: Sep 2, 2004
Est. expiryAug 20, 2022(expired)· nominal 20-yr term from priority
B81B 7/0012
40
PatentIndex Score
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Claims

Abstract

A particle filter for a partially enclosed microelectromechanical systems that include a substrate material having at least one micro-device formed thereon. The particle filter includes a first structural layer forming a filter bottom and a second structural layer forming a filter wall. The filter bottom and filter wall are interconnected by at least one support feature to define a particle trap between the filter wall and filter bottom. The particle trap is a gap formed by mating, but non-interconnected portions of the filter wall and filter bottom that operates to trap and prevent particles from passing beyond the filter bottom into the microelectromechanical system.

Claims

exact text as granted — not AI-modified
We claim:  
     
         1 . A method for constructing a particle filter in a microelectromechanical system, the method comprising: 
 depositing and patterning a plurality of alternating layers of filter forming material and sacrificial material on a substrate material to form at least one filter bottom and at least one filter wall; and    removing the sacrificial material to release the at least one filter bottom and the at least one filter wall to define a particle trap between interfacing portions of the filter bottom and filter wall.    
     
     
         2 . The method of  claim 1  wherein the at least one filter bottom and filter wall are interconnected by at least one support feature.  
     
     
         3 . The method of  claim 1  wherein the step of depositing and patterning the plurality of alternating layers of filter forming material and sacrificial material comprises: 
 forming a filter top including at least one etch release aperture.  
 
     
     
         4 . The method of  claim 3  wherein the filter wall encloses an area circumscribing the at least one etch release aperture.  
     
     
         5 . The method of  claim 1  comprising: 
 patterning the filter bottom into a predetermined one of a plurality of geometric configurations.  
 
     
     
         6 . The method of  claim 1  wherein the particle trap comprises: 
 a gap of pre-determined dimension formed between mating but non-interconnected portions of the filter bottom and filter wall.  
 
     
     
         7 . The method of  claim 6  wherein the filter wall at least partially circumscribes a top portion of the filter bottom to define the particle trap.  
     
     
         8 . The method of  claim 7  wherein the filter wall overlaps the top portion of the filter bottom to form the gap between mating but non-interconnected portions of the filter bottom and filter wall.

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