Coating agent, plasma-resistant component having coating film formed by the coating agent, plasma processing device provided with the plasma-resistant component

Abstract

With a coating-film-forming coating agent 51 used as a resist including a main component such as cyclorubber-bisazide and a photosensitive component, by immersing deposits 52 deposited on the coating film of the coating agent 51 formed on an in-chamber component 50 in a release liquid such as acetone together with the in-chamber component 50 removed from within a chamber 22, the deposits 52 attached to the coating film can be removed along with the coating film from the in-chamber component 50 concurrently with the release of the coating film.

What is claimed is:  
     
         1 . (Amended) An in-chamber member to use in the chamber for performing a plasma process, the in-chamber member comprising: 
 a coating film to which reaction by-products originated from the plasma process are absorbed, the coating film being made of a resist and separated from the in-chamber member in a peeling solvent.    
     
     
         2 . (Amended) The in-chamber member of  claim 1 , wherein the coating film is made of a rest part of the resist except for a photosensitive component.  
     
     
         3 . (Amended) A method for cleaning an in-chamber member disposed in the chamber for performing a plasma process and on which reaction by-products produced by the plasma process are absorbed, the method comprising the steps of: 
 forming in advance a coating film made of a resist on a surface of the in-chamber member; and    after performing the plasma process, immersing the in-chamber member into a peeling solvent to thereby remove the reaction by-products absorbed to the coating film from the in-chamber member together with the coating film that is being separated.    
     
     
         4 . (Amended) The method of  claim 3 , wherein the coating film is made of a rest part of the resist except for a photosensitive component.  
     
     
         5 . (Cancelled)  
     
     
         6 . (New) An in-chamber member to use in the chamber for performing a plasma process, wherein reaction by-products formed on a surface of the in-chamber member is removed by the cleaning method recited in  claim 3  or  4 .  
     
     
         7 . (New) A plasma processing apparatus for micro patterning a surface of an object to be processed by exciting plasma in a chamber thereof, wherein the chamber has therein the in-chamber member of  claim 6.