Aqueous composition containing a semiconductor

Abstract

The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed.

1 . The use of an aqueous composition comprising a semiconductor at a concentration of from 5 to 50 mg, based on 1 l of aqueous composition, as cleaning agent for surfaces under the action of light.  
     
     
         2 . The use as claimed in  claim 1 , characterized in that the semiconductor is used at a concentration of from 10 to 50 mg, based on 1 l of aqueous composition.  
     
     
         3 . The use as claimed in  claim 1  or  2 , characterized in that the semiconductor is titanium dioxide, preferably a titanium dioxide which is at least 70% by weight in the anatase modification.  
     
     
         4 . The use as claimed in one of  claims 1  to  3 , characterized by the use of a doped semiconductor which contains at least 60 mol % semiconductor ions and less than 40 mol % of one or more doping ions from subgroup 8 of the Periodic Table of the Elements.  
     
     
         5 . The use as claimed in  claim 4 , characterized in that a titanium dioxide semiconductor doped with rhodium and/or platinum ions is used.  
     
     
         6 . The use as claimed in one of  claims 1  to  3  under the action of light of a wavelength in the range from 350 to 400 nm, preferably 380 nm, in the outdoors field, or in the indoors field under the action of artificial light.  
     
     
         7 . The use as claimed in  claim 4  or  5  under the action of light of a wavelength in the range from 400 to 650 nm.  
     
     
         8 . The use as claimed in one of  claims 1  to  7 , characterized in that the semiconductor has a mean primary particle size, measured by transmission electron microscopy, in the range from 10 to 2000 nm, preferably in the range from 20 to 200 nm.  
     
     
         9 . The use as claimed in one of  claims 1  to  8 , characterized in that the aqueous composition contains one or more of the following auxiliaries: 
 adhesion promoters, solubilizers, surface-active substances, dispersants and/or thickeners.  
 
     
     
         10 . The use as claimed in one of  claims 1  to  9 , characterized in that the aqueous semiconductor-containing composition is applied to the surfaces to be cleaned by spraying or by means of a distributor, in particular by means of a brush, a sponge or a cloth.  
     
     
         11 . The use as claimed in one of the preceding claims for cleaning buildings or parts thereof or outdoor surrounds of buildings or for cleaning in the indoors field, in particular as kitchen or sanitary cleaner or in medicine, the pharmaceutical industry or the food industry.  
     
     
         12 . A semiconductor powder, in particular titanium dioxide, preferably titanium dioxide in the anatase modification, of a mean primary particle size measured by transmission electron microscopy in the range from 10 to 2000 nm, preferably in the range from 20 to 200 nm, for the use as claimed in one of  claims 1  to  11 .  
     
     
         13 . A semiconductor powder containing at least 60 mol % semiconductor ions and less than 40 mol % of one or more doping ions from subgroup 8 of the Periodic Table of the Elements, in particular rhodium and/or platinum, for the use as claimed in one of  claims 4  to  11 .