US2004137168A1PendingUtilityA1

Dielectric waveguide and method of making the same

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Priority: Nov 22, 2002Filed: Nov 24, 2003Published: Jul 15, 2004
Est. expiryNov 22, 2022(expired)· nominal 20-yr term from priority
Inventors:Vladimir Fuflyigin
G02B 6/02304G02B 6/03688C03B 2203/42Y02P40/57C03B 2203/16C03C 13/043G02B 6/03638C03B 2201/86G02B 6/023C03B 37/01892C03B 37/0183
40
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Claims

Abstract

In general, in one aspect, the invention features a method that includes exposing a surface to a first gas composition under conditions sufficient to deposit a layer of a first chalcogenide glass on the surface, and exposing the layer of the first chalcogenide glass to a second gas composition under conditions sufficient to deposit a layer of a second glass on the layer of the first chalcogenide glass, wherein the second glass is different from the first chalcogenide glass.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
         1 . A method, comprising: 
 exposing a surface to a first gas composition under conditions sufficient to deposit a layer of a first chalcogenide glass on the surface; and    exposing the layer of the first chalcogenide glass to a second gas composition under conditions sufficient to deposit a layer of a second glass on the layer of the first chalcogenide glass, wherein the second glass is different from the first chalcogenide glass.    
     
     
         2 . The method of  claim 1 , wherein exposing the surface to the first gas composition comprises activating a plasma in the first gas composition  
     
     
         3 . The method of  claim 2 , wherein activating a plasma in the first gas composition comprises exposing the gas to electromagnetic radiation to activate the plasma.  
     
     
         4 . The method of  claim 3 , wherein the electromagnetic radiation comprises microwave radiation.  
     
     
         5 . The method of  claim 3 , wherein the electromagnetic radiation comprises radio frequency radiation.  
     
     
         6 . The method of  claim 1 , wherein exposing the layer of the first glass to the second gas composition comprises activating a plasma in the second gas composition.  
     
     
         7 . The method of  claim 6 , wherein activating a plasma in the second gas composition comprises exposing the gas to electromagnetic radiation to activate the plasma.  
     
     
         8 . The method of  claim 7 , wherein the electromagnetic radiation comprises microwave radiation.  
     
     
         9 . The method of  claim 7 , wherein the electromagnetic radiation comprises radio frequency radiation.  
     
     
         10 . The method of  claim 1 , wherein the second gas composition is different from the first gas composition.  
     
     
         11 . The method of  claim 1 , wherein the first gas composition comprises one or more halide compounds.  
     
     
         12 . The method of  claim 11 , wherein the one or more halide compounds comprises a chloride compound.  
     
     
         13 . The method of  claim 1 , wherein the first gas composition comprises a carrier gas.  
     
     
         14 . The method of  claim 13 , wherein the carrier gas comprises nitrogen.  
     
     
         15 . The method of  claim 13 , wherein the carrier gas comprises a noble gas.  
     
     
         16 . The method of  claim 15 , wherein the noble gas is argon.  
     
     
         17 . The method of  claim 1 , wherein the first gas composition comprises a chalcogen.  
     
     
         18 . The method of  claim 1 , wherein the first gas composition pressure is between about 2 and 20 Torr.  
     
     
         19 . The method of  claim 1 , wherein the second gas composition comprises one or more halide compounds.  
     
     
         20 . The method of  claim 19 , wherein the one or more halide compounds comprises a chloride compound.  
     
     
         21 . The method of  claim 1 , wherein the second gas composition comprises a carrier gas.  
     
     
         22 . The method of  claim 21 , wherein the carrier gas comprises nitrogen.  
     
     
         23 . The method of  claim 21 , wherein the carrier gas comprises a noble gas.  
     
     
         24 . The method of  claim 23 , wherein the noble gas is argon.  
     
     
         25 . The method of  claim 1 , wherein the second gas composition comprises a chalcogen.  
     
     
         26 . The method of  claim 1 , wherein the second gas composition comprises oxygen.  
     
     
         27 . The method of  claim 1 , wherein the second gas composition pressure is between about 2 and 20 Torr.  
     
     
         28 . The method of  claim 1 , wherein the second glass is an oxide glass.  
     
     
         29 . The method of  claim 1 , wherein the second glass is a chalcogenide glass.  
     
     
         30 . The method of  claim 1 , wherein the surface is a surface of a tube.  
     
     
         31 . The method of  claim 30 , wherein the surface is an inner surface of a tube.  
     
     
         32 . The method of  claim 30 , wherein the tube comprises a glass.  
     
     
         33 . The method of  claim 32 , wherein the glass is a silicate glass.  
     
     
         34 . The method of  claim 32 , wherein the tube comprises a polymer.  
     
     
         35 . The method of  claim 1 , wherein the surface is a planar surface.  
     
     
         36 . A method, comprising: 
 introducing a first gas composition into a tube, the first gas composition comprising a first compound that is substantially inert with respect to a first material forming the inner surface of the tube; and    exposing the first gas composition to conditions sufficient to change the first compound into a second compound reactive with the first material and to deposit a layer of a second material on the inner surface of the tube.    
     
     
         37 . The method of  claim 36 , wherein exposing the first gas composition to conditions sufficient to change the first compound into a second compound comprises activating a plasma in the first gas composition.  
     
     
         38 . The method of  claim 37 , wherein activating the plasma comprises exposing the first gas composition to electromagnetic radiation.  
     
     
         39 . The method of  claim 38 , wherein the electromagnetic radiation comprises microwave radiation.  
     
     
         40 . The method of  claim 38 , wherein the electromagnetic radiation comprises radio frequency radiation.  
     
     
         41 . The method of  claim 36 , wherein the first compound comprises oxygen.  
     
     
         42 . The method of  claim 41 , wherein the first compound is nitrous oxide.  
     
     
         43 . The method of  claim 42 , wherein the second compound is oxygen.  
     
     
         44 . The method of  claim 38 , wherein the first material is a glass.  
     
     
         45 . The method of  claim 44 , wherein the glass is a chalcogenide glass.  
     
     
         46 . The method of  claim 36 , further comprising exposing the layer of the first material to a second gas composition under conditions sufficient to deposit a layer of a second material on the layer of the first material, wherein the second glass is different from the first glass.

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