US2004118163A1PendingUtilityA1
Production method of synthetic silica glass and thermal treatment apparatus
Est. expiryAug 12, 2019(expired)· nominal 20-yr term from priority
C03B 25/02C03C 2201/02C03C 23/007C03C 2203/40C03C 3/06C03B 32/00C03C 2203/52C03B 19/1453C03B 19/1484C03B 20/00
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Claims
Abstract
A thermal treatment apparatus includes a furnace of a refractory, a stage capable of carrying synthetic silica glass and moving between a first stage position for letting the synthetic silica glass into the furnace and a second stage position for letting the synthetic silica glass out of the furnace, a heat generator for heating the synthetic silica glass, and a driving section connected to the stage, for moving the stage between the first stage position and the second stage position. The thermal treatment apparatus also can include a rotational driving section for rotating the stage.
Claims
exact text as granted — not AI-modified1 . A thermal treatment apparatus comprising:
a furnace of a refractory; a stage capable of carrying synthetic silica glass and moving between a first stage position for letting the synthetic silica glass into the furnace and a second stage position for letting the synthetic silica glass out of the furnace; a heat generator for heating the synthetic silica glass; and a driving section connected to the stage, for moving the stage between the first stage position and the second stage position.
2 . A thermal treatment apparatus according to claim 1 , further comprising a rotational driving section for rotating the stage.Join the waitlist — get patent alerts
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