US2004099345A1PendingUtilityA1

Component which is intended for a facility for producing or preparing glass melts

42
Priority: Jan 30, 2002Filed: Jan 30, 2003Published: May 27, 2004
Est. expiryJan 30, 2022(expired)· nominal 20-yr term from priority
Inventors:Erhard DickErich FischerRoland FuchsMarkus RiedlMichael OechsleGerhard ReberThomas Udo
C03B 5/425C03B 5/1675C23C 8/10C03B 5/43
42
PatentIndex Score
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Claims

Abstract

The present invention relates to a method of treating a component which is intended for a facility for producing or preparing glass melts and has surfaces which are made of noble metal and come into contact with glass melts during operation. The present invention is characterized by the following feature: the component is subjected to an oxidizing atmosphere for a certain period of time before being put into operation.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
         1 . A method of treating a component, which is intended for a facility for producing or preparing glass melts and has surfaces which are made of noble metal and come into contact with glass melts during operation, characterized by the following feature: 
 1.1 the component is subjected to an oxidizing atmosphere for a certain period of time before being put into operation.    
     
     
         2 . The method according to  claim 1 , 
 characterized in that the component is subjected to an elevated temperature during the time period cited.    
     
     
         3 . The method according to  claim 2 , 
 characterized in that the temperature lies above the operating temperature of the component.    
     
     
         4 . The method according to  claim 3 , 
 characterized in that the temperature lies between 1000° C. and 2000° C.    
     
     
         5 . The method according to  claim 4 , 
 characterized in that the temperature lies between 1100° C. and 1500° C.    
     
     
         6 . The method according to one of  claims 1  to  5 , 
 characterized in that the time span lies between 1 and 500 hours.  
 
     
     
         7 . The method according to  claim 6 , 
 characterized in that the time span lies between 100 and 500 hours.    
     
     
         8 . The method according to one of  claims 1  to  7 , 
 characterized in that the temperature is changed during the treatment of the component.  
 
     
     
         9 . The method according to  claim 8 , 
 characterized in that the temperature is high during a first treatment phase and is low during a second treatment phase, or the temperature is low during a first treatment phase and is high during a second treatment phase.    
     
     
         10 . The method according to one of  claims 1  to  9 , 
 characterized in that an oxidizing gas is applied to the component during at least a part of the treatment period.  
 
     
     
         11 . A device for treating a component, which is intended for a facility for producing or preparing glass melts and has surfaces which are made of noble metal and come into contact with glass melts during operation, characterized by a treatment chamber which receives the component and in which an elevated temperature may be set.  
     
     
         12 . The device according to  claim 11 , 
 characterized in that the temperature in the chamber may be set to a value which lies above room temperature or above the operating temperature.    
     
     
         13 . The device according to  claim 11  or  12 , 
 characterized in that the chamber has an inlet for applying an oxidizing gas.

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