US2004084318A1PendingUtilityA1

Methods and apparatus for activating openings and for jets plating

Priority: Nov 5, 2002Filed: Oct 17, 2003Published: May 6, 2004
Est. expiryNov 5, 2022(expired)· nominal 20-yr term from priority
Inventors:Uri Cohen
H10P 14/47H10W 20/057H10P 14/46C25D 5/627C25D 5/611C25D 5/20C25D 7/123C25D 5/08
43
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

One embodiment of the present invention is a method for electrofilling a metal or alloy inside at least one opening located in a front surface of a substrate, said front surface of the substrate includes the at least one opening and a top field surrounding the at least one opening, said at least one opening includes a bottom and sidewalls surfaces wherein at least the bottom surface comprises an exposed metallic surface, said method includes steps of: (a) immersing the substrate in an activation (or wetting) solution; (b) applying ultrasonic or megasonic vibrations to the substrate and to the activation (or wetting) solution; (c) applying high pressure electrolyte jets to the substrate, said electrolyte includes metallic ions of said metal or alloy; and (d) applying an electroplating current to the substrate to electroplate said metal or alloy inside the at least one opening.

Claims

exact text as granted — not AI-modified
What I claim is:  
     
         1 . A method for electrofilling a metal or alloy inside at least one opening located in a front surface of a substrate, said front surface of the substrate comprises the at least one opening and a top field surrounding the at least one opening, said at least one opening comprises a bottom and sidewalls surfaces wherein at least the bottom surface comprises an exposed metallic surface, said method includes steps of: 
 immersing the substrate in an activation (or wetting) solution;    applying ultrasonic or megasonic vibrations to the substrate and to the activation (or wetting) solution;    applying high pressure electrolyte jets to the substrate, said electrolyte comprises metallic ions of said metal or alloy; and    applying an electroplating current to the substrate to electroplate said metal or alloy inside the at least one opening.    
     
     
         2 . The method of  claim 1  wherein the electrolyte further comprises at least one inhibitor additive.

Join the waitlist — get patent alerts

Track US2004084318A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.