Pellicle

Abstract

A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A): fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.

What is claimed is:  
     
         1 . A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane or the adhesive comprises the following fluorine-containing polymer (A): 
 fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.    
     
     
         2 . The pellicle according to  claim 1 , wherein the fluorine-containing polymer (A) is a polymer having monomer units formed by polymerization of a monomer (b) represented by CHR 1 ═CR 2 R 3 , wherein each of R 1 , R 2  and R 3  which are independent of one another, is a hydrogen atom, a fluorine atom or a monovalent organic group, and monomer units formed by polymerization of a monomer (c) represented by CFR 4 ═CR 5 R 6 , wherein each of R 4 , R 5  and R 6  which are independent of one another, is a fluorine atom or a monovalent fluorine-containing organic group, or R 4  and R 5  together form a bivalent fluorine-containing organic group and R 6  is a fluorine atom or a monovalent fluorine-containing organic group, or R 5  and R 6  together form a bivalent fluorine-containing organic group and R 4  is a fluorine atom or a monovalent fluorine-containing organic group.  
     
     
         3 . The pellicle according to  claim 2 , wherein the monomer (b) is at least one monomer selected from olefins and fluoroolefins having a hydrogen atom bonded to a carbon atom in an unsaturated group, and the monomer (c) is a fluorine-containing unsaturated alicyclic monomer which may have an oxygen atom as an atom constituting the ring.  
     
     
         4 . The pellicle according to  claim 1 , wherein the fluorine-containing polymer (A) is a polymer having monomer units formed by cyclic polymerization of a monomer (d) represented by CH 2 ═CR 7 -Q-CR 8 ═CF 2 , wherein each of R 7  and R 8  which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group, and Q is a bivalent fluorine-containing organic group.  
     
     
         5 . The pellicle according to  claim 1 , wherein the fluorine-containing polymer (A) is a polymer having monomer units formed by polymerization of a fluorine-containing unsaturated alicyclic monomer which may have an oxygen atom as an atom constituting the ring, represented by CFR 4 ═CR 5 R 6 , wherein R 4  and R 5  together form a bivalent fluorine-containing organic group and R 6  is a fluorine atom or a monovalent fluorine-containing organic group, or R 5  and R 6  together form a bivalent fluorine-containing organic group and R 4  is a fluorine atom or a monovalent fluorine-containing organic group, and monomer units formed by cyclic polymerization of a monomer (d) represented by CH 2 ═CR 7 -Q-CR 8 ═CF 2 , wherein each of R 7  and R 8  which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group, and Q is a bivalent fluorine-containing organic group.  
     
     
         6 . The pellicle according to  claim 4  or  5 , wherein the monomer (d) is a monomer represented by CH 2 ═CH—R f —O—CF═CF 2 , wherein R f  is a C 1-4  perfluoroalkylene group.  
     
     
         7 . A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the pellicle membrane comprises a fluorine-containing polymer which is the following fluorine-containing polymer (A) and which has an alicyclic structure in its main chain, provided that a part of atoms constituting the alicyclic structure may be oxygen atoms: 
 fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.    
     
     
         8 . The pellicle according to  claim 7 , wherein the fluorine-containing polymer (A) is a copolymer of at least one monomer selected from olefins and fluoroolefins having a hydrogen atom bonded to a carbon atom in an unsaturated group, and a fluorine-containing unsaturated alicyclic monomer which may have an oxygen atom as an atom constituting the ring, represented by CFR 4 ═CR 5 R 6 , wherein R 4  and R 5  together form a bivalent fluorine-containing organic group and R 6  is a fluorine atom or a monovalent fluorine-containing organic group, or R 5  and R 6  together form a bivalent fluorine-containing organic group and R 4  is a fluorine atom or a monovalent fluorine-containing organic group.  
     
     
         9 . The pellicle according to  claim 7 , wherein the fluorine-containing polymer (A) is a polymer having monomer units formed by cyclic polymerization of a monomer (d) represented by CH 2 ═CR 7 -Q-CR 8 ═CF 2 , wherein each of R 7  and R 8  which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group, and Q is a bivalent fluorine-containing organic group.  
     
     
         10 . The pellicle according to  claim 7 , wherein the fluorine-containing polymer (A) is a polymer having monomer units formed by polymerization of a fluorine-containing unsaturated alicyclic monomer which may have an oxygen atom as an atom constituting the ring, represented by CFR 4 ═CR 5 R 6 , wherein R 4  and R 5  together form a bivalent fluorine-containing organic group and R 6  is a fluorine atom or a monovalent fluorine-containing organic group, or R 5  and R 6  together form a bivalent fluorine-containing organic group and R 4  is a fluorine atom or a monovalent fluorine-containing organic group, and monomer units formed by cyclic polymerization of a monomer (d) represented by CH 2 ═CR 7 -Q-CR 8 ═CF 2 , wherein each of R 7  and R 8  which are independent of each other, is a hydrogen atom, a fluorine atom or a monovalent fluorine-containing organic group, and Q is a bivalent fluorine-containing organic group.  
     
     
         11 . The pellicle according to  claim 9  or  10 , wherein the monomer (d) is a monomer represented by CH 2 ═CH—R f —O—CF═CF 2 , wherein R f  is a C 1-4  perfluoroalkylene group.  
     
     
         12 . A pellicle for a photolithographic patterning process by means of a light having a wavelength of at most 200 nm, comprising a frame and a pellicle membrane bonded to the frame by means of an adhesive, wherein the adhesive comprises the following fluorine-containing polymer (A): 
 fluorine-containing polymer (A): a substantially linear fluorine-containing polymer having a chain of carbon atoms as the main chain, and containing as carbon atoms in its main chain, a carbon atom having one or two hydrogen atoms bonded thereto and a carbon atom having no hydrogen atom bonded thereto and having a fluorine atom or a fluorine-containing organic group bonded thereto.    
     
     
         13 . The pellicle according to  claim 12 , wherein the fluorine-containing polymer (A) is a fluorine-containing polymer having an alicyclic structure in its main chain, provided that a part of atoms constituting the alicyclic structure may be oxygen atoms.  
     
     
         14 . The pellicle according to  claim 12  or  13 , wherein the fluorine-containing polymer (A) is a fluorine-containing polymer having functional groups.  
     
     
         15 . The pellicle according to  claim 12 , wherein the fluorine-containing polymer (A) is a fluorine-containing polymer having no alicyclic structure in its main chain.  
     
     
         16 . A photolithographic patterning process by means of a light having a wavelength of at most 200 nm in photolithography, which comprises using the pellicle as defined in  claim 1 ,  7  or  12 .  
     
     
         17 . The photolithographic patterning process according to  claim 16 , wherein the light having a wavelength of at most 200 nm is a fluorine gas excimer laser light.