Manufacturing apparatus

Abstract

The present invention provides an evaporation apparatus, which is one type of film formation apparatus and provides superior uniformity in EL layer film thickness, superior throughput, and improved utilization efficiency of EL materials and an evaporation method. The present invention is characterized in that an evaporation source holder, in which a container that encloses an evaporation material is disposed, is moved at a certain pitch with respect to a substrate during evaporation. Further, a film thickness monitor is integrated with the evaporation source holder for the movement. Furthermore, film thickness can be made uniform by adjusting the moving speed of the evaporation source holder in accordance with values measured by the film thickness monitor.

What is claimed is:  
     
         1 . A manufacturing apparatus comprising: 
 a loading chamber;    a transporting chamber coupled to the loading chamber;    a plurality of film formation chambers coupled to the transporting chamber;    a processing chamber coupled to the transporting chamber;    wherein each of the plurality of film formation chambers is coupled to a vacuum evacuation processing chamber for making the inside of the film formation chamber vacuum;    wherein each of the plurality of film formation chambers comprises: 
 an alignment means for performing a position alignment of a mask and a substrate;  
 a substrate holding means;  
 an evaporation source holder; and  
 a means for moving the evaporation source holder;  
   wherein the evaporation source holder comprises: 
 a container that seals an evaporation material;  
 a means for heating the container; and  
 a shutter formed over the container;  
   wherein the processing chamber is coupled to a vacuum evacuation processing chamber for providing a vacuum state,    wherein a plurality of plate heaters are disposed within the processing chamber so as to overlap and open gaps therebetween, and    wherein the processing chamber can perform vacuum heating on a plurality of substrates.    
     
     
         2 . A manufacturing apparatus according to  claim 1 , wherein a means for moving the evaporation source holder functions to move the evaporation source holder in an x-axis direction at a certain pitch, and functions to move the evaporation source holder in a y-axis direction at a certain pitch.  
     
     
         3 . A manufacturing apparatus according to  claim 1 , wherein the evaporation source holder is rotated when switching between the x-axis direction and the y-axis direction.  
     
     
         4 . A manufacturing apparatus according to  claim 1 , wherein a hole of an opening surface area S 2 , which is smaller than an opening surface area S 1  of the container, is opened in the shutter.  
     
     
         5 . A manufacturing apparatus according to  claim 1 , wherein a film thickness monitor is formed adjacent to the evaporation source holder.  
     
     
         6 . A manufacturing apparatus according to  claim 1 , wherein the inert gas element comprises at least one selected from the group consisting of He, Ne, Ar, Kr, and Xe.  
     
     
         7 . A manufacturing apparatus comprising: 
 a loading chamber;    a transporting chamber coupled to the loading chamber;    a plurality of film formation chambers coupled to the transporting chamber;    a processing chamber coupled to the transporting chamber;    wherein each of the plurality of film formation chambers is coupled to a vacuum evacuation processing chamber for making the inside of the film formation chamber vacuum;    wherein each of the plurality of film formation chambers comprises: 
 an alignment means for performing position alignment of a mask and a substrate;  
 a substrate holding means;  
 an evaporation source holder; and  
 a means for moving the evaporation source holder;  
   wherein the evaporation source holder comprises: 
 a container that seals an evaporation material;  
 a means for heating the container; and  
 a shutter formed over the container;  
   wherein the processing chamber is coupled to a vacuum evacuation processing chamber for providing a vacuum state, and    wherein at least one of a hydrogen gas, an oxygen gas, and an inert gas is introduced in the processing chamber to generate a plasma.    
     
     
         8 . A manufacturing apparatus according to  claim 7 , wherein a plurality of plate heaters are disposed in the transporting chamber so as to overlap and open gaps therebetween and a processing chamber capable of performing vacuum heating on a plurality of substrates is coupled to the transporting chamber.  
     
     
         9 . A manufacturing apparatus according to  claim 7 , wherein a means for moving the evaporation source holder functions to move the evaporation source holder in an x-axis direction at a certain pitch, and functions to move the evaporation source holder in a y-axis direction at a certain pitch.  
     
     
         10 . A manufacturing apparatus according to  claim 7 , wherein the evaporation source holder is rotated when switching between the x-axis direction and the y-axis direction.  
     
     
         11 . A manufacturing apparatus according to  claim 7 , wherein a hole of an opening surface area S 2 , which is smaller than an opening surface area S 1  of the container, is opened in the shutter.  
     
     
         12 . A manufacturing apparatus according to  claim 7 , wherein a film thickness monitor is formed adjacent to the evaporation source holder.  
     
     
         13 . A manufacturing apparatus according to  claim 7 , wherein the inert gas element comprises at least one selected from the group consisting of He, Ne, Ar, Kr, and Xe.