US2004035441A1PendingUtilityA1
Apparatus and method for cleaning substrate
Priority: Oct 14, 1999Filed: Aug 26, 2003Published: Feb 26, 2004
Est. expiryOct 14, 2019(expired)· nominal 20-yr term from priority
Inventors:Lim-Su Lee
H10P 72/0412H10P 52/00G02F 1/133302
36
PatentIndex Score
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Claims
Abstract
A substrate cleaning apparatus and method for a liquid crystal display panel capable of removing foreign substances attached to the lower and upper surfaces of a substrate as well as onto the side surface thereof. The apparatus includes upper and lower cleaning modules arranged in such a manner as to contact the upper and lower surfaces of the substrate. Also, a side-cleaning module is arranged at the side surfaces of the substrate.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A substrate cleaning apparatus for cleaning a substrate of a liquid crystal display panel comprising:
a first cleaning module on a substrate, said substrate having upper and lower surfaces; and a side-cleaning module at a side surface of the substrate.
2 . The apparatus of claim 1 , wherein the side-cleaning module includes a brush cleaner.
3 . The apparatus of claim 2 , wherein the brush cleaner extends partially along the side surface of the substrate.
4 . The apparatus of claim 2 , wherein the brush cleaner of the side-cleaning module is rotatable.
5 . The apparatus of claim 2 , wherein the side-cleaning module further comprises a water jet device.
6 . The apparatus of claim 5 , wherein the water jet device generates ultrasonic waves onto the side surface of the substrate.
7 . The apparatus of claim 5 , wherein the water jet device generates ultrasonic waves onto the side surface of the substrate at a high pressure.
8 . The apparatus of claim 1 , wherein the side-cleaning module comprises a vibration generating device.
9 . The apparatus of claim 8 , wherein the vibration generating device includes a sonar.
10 . The apparatus of claim 8 , wherein the vibration generating device generates ultrasonic waves onto the side surface of the substrate.
11 . The apparatus of claim 8 , wherein the vibration generating device jets water onto the side surface of the substrate.
12 . The apparatus of claim 1 , wherein the first cleaning module includes a brush cleaner.
13 . A method of cleaning a substrate of a liquid crystal display panel comprising:
providing a first cleaning module on a substrate, said substrate having upper and lower surfaces; providing a side-cleaning module on a side surface of the substrate; removing foreign substances on a side surface of the substrate using the side-cleaning module; and removing foreign substances on the upper and lower surface of the substrate using the cleaning module.
14 . The method of claim 13 , wherein the side-cleaning module is rotatable.
15 . The method of claim 14 , wherein the side-cleaning module extends partially along the side surface of the substrate.
16 . The method of claim 13 , wherein the first cleaning module is rotatable.
17 . The method of claim 13 , wherein the first cleaning module includes upper and lower cleaning brushes.
18 . The method of claim 17 , wherein the upper and lower cleaning brushes are arranged at the upper and lower surfaces of the substrate, respectively.
19 . The method of claim 13 , further comprising cleaning the side surface of the substrate using a water jet device.
20 . The method of claim 19 , wherein the water jet device generates ultrasonic waves.
21 . The method of claim 19 , wherein the cleaning step includes jetting water onto the side surface of the substrate at a high pressure.
22 . The method of claim 21 , wherein the water includes de-ionized water.
23 . A method of cleaning a substrate of a liquid crystal display panel comprising:
providing a cleaning module at a substrate, said substrate having upper and lower surfaces; providing a side-cleaning module arranged at a side surface of the substrate; removing foreign substances on a side surface of the substrate using the side-cleaning module; removing foreign substances on the upper and lower surface of the substrate using the cleaning module; and cleaning the side surface of the substrate using a water jet device.
24 . The method of claim 23 , wherein the water jet device causes vibration on the side surface of the substrate.
25 . The method of claim 24 , wherein the vibration is generated by ultrasonic waves.
26 . The method in claim 23 , wherein the cleaning step includes jetting water onto the side surface of the substrate at a high pressure.
27 . The method of claim 26 , wherein the water includes de-ionized water.Join the waitlist — get patent alerts
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