Plasma treatment apparatus

Abstract

A plasma CVD apparatus has a container, and channels composed of introduction grooves and circumferential grooves for different types of gases are formed within the container. The gases introduced through source gas piping, auxiliary gas piping, and cleaning gas piping are equally supplied to a plurality of supply nozzles, a plurality of auxiliary gas supply nozzles, and a plurality of cleaning gas nozzles. The configuration of the container can be simplified without complicating pipings for the gases.

What is claimed is:  
     
         1 . A plasma treatment apparatus which introduces a treatment gas into a treatment chamber through a treatment gas nozzle, and generates a plasma in said treatment chamber to treat a surface of a substrate with atoms and molecules excited and activated in said treatment chamber, comprising: 
 a container defining said treatment chamber;    a groove, formed in a thick-walled portion between an outer wall and an inner wall of said container, for allowing passage of said treatment gas; and    said treatment gas nozzle connected to said groove.    
     
     
         2 . A plasma treatment apparatus which introduces a treatment gas into a treatment chamber through a treatment gas nozzle, and generates a plasma in said treatment chamber to treat a surface of a substrate with atoms and molecules excited and activated in said treatment chamber, comprising: 
 a container defining said treatment chamber, said container being divided into an upper container and a lower container;    a circumferential groove, formed in said upper container, for allowing passage of said treatment gas;    said treatment gas nozzle connected to said circumferential groove;    an introduction groove, formed in said lower container, for allowing passage of said treatment gas;    treatment gas introduction means connected to said introduction groove; and    communication means for bringing said circumferential groove and said introduction groove into communication with each other at a plurality of locations.    
     
     
         3 . The plasma treatment apparatus according to  claim 2 , wherein: 
 said introduction groove is formed over a length of nearly a half of a circumference in a circumferential direction of said container;    said treatment gas introduction means is in communication with a halfway portion of said introduction groove; and    said communication means are in communication with opposite ends of said introduction groove.    
     
     
         4 . The plasma treatment apparatus according to  claim 2  or  3 , wherein 
 said circumferential groove, said introduction groove, a portion of communication between said treatment gas nozzle and said circumferential groove, a portion of communication between said treatment gas introduction means and said introduction groove, and said communication means for establishing communication between said circumferential groove and said introduction groove are each formed by machining.  
 
     
     
         5 . The plasma treatment apparatus according to any one of  claims 2  to  4 , wherein 
 a seal ring member is provided at a junction between said upper container and said lower container, and disposed on a side opposite to said treatment chamber, with said communication means for communication between said circumferential groove and said introduction groove being located between said seal ring member and said treatment chamber.