US2004017896A1PendingUtilityA1

Apparatus and method for characterizing libraries of different materials using x-ray scattering

Assignee: SYMYX TECHNOLOGIES INCPriority: Dec 18, 1998Filed: May 22, 2003Published: Jan 29, 2004
Est. expiryDec 18, 2018(expired)· nominal 20-yr term from priority
G01N 23/20B01J 19/0046B01J 2219/00315B01J 2219/00511B01J 2219/00585B01J 2219/00596B01J 2219/00659B01J 2219/00704B01J 2219/00707B01J 2219/00745C40B 40/18Y10T436/25
51
PatentIndex Score
0
Cited by
0
References
0
Claims

Abstract

An apparatus for characterizing a library containing an array of samples. The apparatus includes an x-ray beam directed at the library, a chamber housing the library and a beamline for directing the x-ray beam onto the library in the chamber. The chamber may include a translation stage that holds the library and that is programmable to change the position of the library relative to the x-ray beam and a controller that controls the movement of the translation stage to expose an element to the x-ray beam in order to rapidly characterize the element in the library. During the characterization, the x-ray beam diffracts upon impinging the element and a detector detects the diffracted x-ray beam in order to generate characterization data for the element.

Claims

exact text as granted — not AI-modified
What is claimed is:  
     
         1 . Apparatus for characterizing a library containing a plurality of samples, said apparatus comprising: 
 an x-ray source for producing an x-ray beam;    a chamber positioned in the x-ray beam having an interior sized and shaped for holding said library of samples;    a stage connected to the chamber for moving the library containing the plurality of samples relative to the x-ray beam to align a pre-selected sample of said plurality of samples with the x-ray beam to expose the pre-selected sample to the x-ray beam thereby causing the x-ray beam to diffract and form a diffraction pattern characteristic of materials present in the pre-selected sample; and    a detector mounted adjacent the stage for detecting the diffraction pattern resulting from the diffracted x-ray beam thereby permitting characterization of the pre-selected sample of said plurality of samples in the library.    
     
     
         2 . Apparatus as set forth in  claim 1  further comprising a beamline positioned along the x-ray beam for directing the x-ray beam toward the library containing the plurality of samples when the library is positioned in the interior of the chamber.  
     
     
         3 . Apparatus as set forth in  claim 2  wherein at least one of the detector and the beamline are moveable with respect to the stage so as to permit changes in an angle between a first line extending from the beamline to the preselected sample of said plurality of samples and a second line extending from the pre-selected sample and the detector.  
     
     
         4 . Apparatus as set forth in  claim 1  further comprising a controller operatively connected to the stage for controlling movement of the stage thereby determining which sample of said plurality of samples in the library is exposed to the x-ray beam.  
     
     
         5 . Apparatus as set forth in  claim 4  wherein the controller includes a computer system having a user interface permitting independent user selection of which sample of said plurality of samples in the library is exposed to the x-ray beam and of an order in which said samples are selected for exposure to the x-ray beam.  
     
     
         6 . Apparatus as set forth in  claim 1  wherein the stage comprises a first positioning mechanism for moving the library containing the plurality of samples in a first direction relative to the x-ray beam and a second positioning mechanism for moving the library containing the plurality of samples in a second direction relative to the x-ray beam different than said first direction.  
     
     
         7 . Apparatus as set forth in  claim 6  wherein said second direction extends normal to said first direction.  
     
     
         8 . Apparatus as set forth in  claim 6  wherein each of said first and second positioning mechanisms includes a stepper motor.  
     
     
         9 . Apparatus as set forth in  claim 1  in combination with a library containing a plurality of samples.  
     
     
         10 . A method for operating an x-ray characterization apparatus for characterizing a library containing a plurality of samples arranged in a predetermined pattern, said apparatus comprising an x-ray source for producing an x-ray beam, a stage for moving the library to align a pre-selected sample of said plurality of samples with the x-ray beam, and a detector for detecting a diffraction pattern, said method comprising the steps of: 
 loading a library into the apparatus;    activating the x-ray source to produce an x-ray beam traveling along a beampath;    zeroing the stage when the library is in a predetermined position relative to the beampath to establish an reference origin for stage movement;    actuating the stage to move the library to a first position in which a first pre-selected sample of said plurality of samples in the library is aligned with the beampath along which the x-ray beam travels;    exposing the first pre-selected sample of said plurality of samples in the library to the x-ray beam thereby causing the x-ray beam to diffract and form a diffraction pattern characteristic of materials present in the first pre-selected sample;    detecting with the apparatus detector the diffraction pattern resulting from exposure of the first pre-selected sample to the x-ray beam;    recording the diffraction pattern resulting from exposure of the first pre-selected sample to the x-ray beam;    activating the stage to move the library to a second position in which a second pre-selected sample of said plurality of samples in the library is aligned with the beampath along which the x-ray beam travels;    exposing the second pre-selected sample of said plurality of samples in the library to the x-ray beam thereby causing the x-ray beam to diffract and form a diffraction pattern characteristic of materials present in the second pre-selected sample;    detecting with the apparatus detector the diffraction pattern resulting from exposure of the second pre-selected sample to the x-ray beam; and    recording the diffraction pattern resulting from exposure of the second pre-selected sample to the x-ray beam.    
     
     
         11 . A method as set forth in  claim 10  further comprising the steps of: 
 processing the diffraction pattern resulting from exposure of the first pre-selected sample to the x-ray beam to determine the materials present in said first pre-selected sample of said plurality of samples in the library; and  
 processing the diffraction pattern resulting from exposure of the second pre-selected sample to the x-ray beam to determine the materials present in said second pre-selected sample of said plurality of samples in the library.  
 
     
     
         12 . A method as set forth in  claim 11  wherein the steps of processing the diffraction pattern resulting from exposure of said first pre-selected sample to the x-ray beam and activating the stage to move the library to the second position occur during overlapping time intervals.  
     
     
         13 . A method as set forth in  claim 10  wherein the library is in said first position when the stage is zeroed.  
     
     
         14 . A method as set forth in  claim 10  wherein the apparatus comprises a safety shutter and the method comprises the step of opening the safety shutter.  
     
     
         15 . A method as set forth in  claim 10  wherein the stage includes a stepper motor and the step of activating the stage to move the library to said second position includes signaling the stepper motor to take a predetermined number of steps.  
     
     
         16 . A method as set forth in  claim 10  wherein the step of activating the x-ray source occurs before the step of actuating the stage to move the library to the first position.  
     
     
         17 . A method as set forth in  claim 10  wherein the step of activating the x-ray source occurs before the step of zeroing the stage.  
     
     
         18 . A method as set forth in  claim 10  further comprising the step of adjusting environmental conditions surrounding the library.  
     
     
         19 . Apparatus for characterizing a library containing an array of material members comprising: 
 an x-ray beam source;    a beamline being adapted to direct, with a predefined beam cross-section, the x-ray beam onto the library;    a chamber adapted to hold the library;    library positioning means adapted to position the library relative to the x-ray beam so as to make each member exposable to the x-ray beam; and    a detector allowing the detection of a photon scattered by one of the members exposed to the x-ray beam in order to generate characterization data for said one member.    
     
     
         20 . A method for characterizing a library containing an array of members, comprising the steps of: 
 adjusting environmental characteristics surrounding the library;    directing an x-ray beam generated by an x-ray source and having a predefined beam cross-section onto the library by means of a beamline;    moving the library by a library positioning means in a predetermined manner to expose a member of the library to the x-ray beam in order to rapidly characterize each member in the library; and    detecting photons scattered by the member in order to characterize the member.

Join the waitlist — get patent alerts

Track US2004017896A1 — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.