US2004017565A1PendingUtilityA1

Glow discharge emission spectroscopic analysis apparatus

Priority: Dec 22, 1998Filed: Jul 28, 2003Published: Jan 29, 2004
Est. expiryDec 22, 2018(expired)· nominal 20-yr term from priority
G01N 21/67
34
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Claims

Abstract

This invention provides a glow discharge emission spectroscopic analysis apparatus which is capable of making a desired chemical analysis with excellent reproducibility. A glow discharge emission spectroscopic analysis apparatus of this invention is constituted so that the sample is held by a first electrical conductor provided on one side of a glow discharge tube and a second electrical conductor is movable by a cylinder rod to secure the sample in contact with the first electrical conductor. The electrical conductors can be electrically connected with each other. when the sample is secured, and a negative electric potential is applied to the electrical conductors.

Claims

exact text as granted — not AI-modified
In the claims:  
     
         17 . (New) An apparatus for determining the elements in a semiconductor wafer, comprising: 
 a conductor member having an aperture, the conductor member has a size to extend across the semiconductor wafer and contact one surface of the semiconductor wafer to enable an application of uniform potential to be applied to the entire surface of the semiconductor wafer to be sampled;    means for mounting the semiconductor wafer on the conductor member;    a glow discharge chamber unit having an anode and an opening adjacent the aperture of the conductor member;    means for exerting a force on the semiconductor wafer to seal at least a portion of the surface to be sampled to the glow discharge chamber unit opening when mounted on the conductor member;    means for providing a sputtering gas to the glow discharge chamber unit;    means for providing an electrical charge of sufficient power to the conductor member to uniformly charge the surface of the semiconductor wafer as a cathode to the anode, whereby a glow discharge emission is created as the semiconductor wafer is sputtered; and    means for providing a spectroscopic analysis of the light from the glow discharge emission to determine the elements in the semiconductor wafer.    
     
     
         18 . (New) The apparatus of  claim 17  wherein the conductor member is larger in size than the semiconductor wafer.  
     
     
         19 . (New) The apparatus of  claim 17 , wherein the conductor member is resiliently mounted to permit adjustable movement between the conductor member and the semiconductor wafer when the semiconductor wafer is mounted on the conductor member.  
     
     
         20 . (New) A system for determining the elements in a semiconductor sample, comprising: 
 a semiconductor wafer;    a conductor member, the conductor member has a size to extend across a first surface of the semiconductor wafer to enable an application of uniform potential to be applied to a surface of the semiconductor wafer to be sampled;    means for mounting the first surface of the semiconductor wafer on the conductor member;    a glow discharge chamber unit having an anode and an opening adjacent the conductor member;    means for exerting a force on the semiconductor wafer to seal at least a portion of a second surface of the semiconductor wafer to be sampled to the glow discharge chamber unit opening when mounted on the conductor member;    means for providing a sputtering gas to the glow discharge chamber unit;    means for providing an electrical charge of sufficient power to the conductor member to uniformly change the first surface of the semiconductor wafer as a cathode to the anode, whereby a glow discharge emission is created as the semiconductor wafer is sputtered; and    means for providing a spectroscopic analysis of the light from the glow discharge emission to determine the elements in the semiconductor wafer.

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