Low pressure vapor phase deposition of organic thin films

Abstract

Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.

What is claimed is:  
     
         1 . An apparatus for the physical vapor deposition of a film comprising an organic small molecule material on a substrate, said apparatus comprising: 
 (a) a deposition chamber;    (b) at least one flow path in fluid communication with said deposition chamber, said flow path comprising: 
 (i) a carrier gas source,  
 (ii) an organic small molecule material source, and  
 (iii) a flow controller;  
   (c) a substrate holder disposed within said deposition chamber; and    (d) a vacuum pump in fluid communication with said deposition chamber and adapted to provide a pressure ranging from  0 . 001  torr to  100  torr within said deposition chamber;    wherein the deposition chamber has walls that may be heated to a temperature sufficiently high to avoid recondensation of volatilized organic precursor, without decomposing the volatilized organic precursor.    
     
     
         2 . The apparatus of  claim 1 , wherein said flow controller includes a pressure regulator.  
     
     
         3 . The apparatus of  claim 1 , wherein said flow controller includes a flow meter.  
     
     
         4 . The apparatus of  claim 1 , wherein said flow controller includes a switching valve.  
     
     
         5 . The apparatus of  claim 1 , wherein said deposition chamber has heated walls.  
     
     
         6 . The apparatus of  claim 1 , wherein said deposition chamber is provided with one or more radiant heat sources.  
     
     
         7 . The apparatus of  claim 1 , further comprising a heater substantially surrounding said deposition chamber.  
     
     
         8 . The apparatus of  claim 7 , wherein said heater is a multi-zone heater/cooler.  
     
     
         9 . The apparatus of  claim 1 , wherein the substrate holder is cooled.  
     
     
         10 . The apparatus of  claim 9 , wherein the substrate holder comprises a temperature-control block.  
     
     
         11 . The apparatus of  claim 1 , wherein said organic small molecule material source is an open container holding said organic small molecule material.  
     
     
         12 . The apparatus of  claim 11 , wherein said open container is heated.  
     
     
         13 . The apparatus of  claim 1 , wherein said apparatus comprises two or more flow paths.  
     
     
         14 . An apparatus for physical vapor deposition of a film comprising an organic small molecule material on a substrate, said apparatus comprising: 
 a deposition chamber;    means for heating said deposition chamber;    means for introducing vapors of organic small molecule materials into said deposition chamber;    means for cooling a substrate within said deposition chamber; and    means for maintaining the pressure in said reaction chamber at a pressure ranging from 0.001 torr to 100 torr;    means for heating the deposition chamber walls to a temperature sufficiently high to avoid recondensation of vapors of the organic small molecule materials, without decomposing the organic small molecule materials.