Device for examining contact state of films, method of examining contact state of films, and film for examination

Abstract

The present invention is to easily examine the contact state of two piled films in a short time. In the present invention, light from a light source 13 is radiated from a base material side of a test negative 71 under the condition where a mat surface 70 B having a light scattering property of a test film 70 faces and contacts a sensitized surface 71 B having a stripe pattern 72 recorded thereon of a test negative 71, the image of the stripe pattern irradiated with the transparent light which goes through the test negative 71 and the test film 70 in order is photographed from the surface 70 A side of the test film 70, and the image of the photographed stripe pattern 72 is displayed, thereby the user can visually recognize that the test negative 71 and the test film 70 are in an optimal contact state at this time when the image of the stripe pattern 72 is clearly displayed and on the other hand, the user can visually recognize that the test negative 71 and the test film 70 have space between them and are in the non-contact state, not in the contact state, at this time when the image of the stripe pattern 72 is unclearly displayed.

1 . A device for examining contact state of films, comprising: 
 photographing means for photographing the image of a prescribed pattern irradiated with transparent light which is radiated by a light source from the other surface side of a first film and goes through the first film and a second film in order, from the other surface side of the second film, under such a condition that one surface having the light scattering property of the second film faces and contacts one surface having the prescribed pattern recorded thereon of the first film; and    display means for displaying the image of the prescribed pattern photographed by said photographing means.    
     
     
         2 . The device for examining contact state of films according to  claim 1 , wherein 
 said device for examining contact state of films comprises: 
 waveform pattern creating means for creating a waveform pattern based on a luminance level in the image of the prescribed pattern photographed by said photographing means; and  
 overlaying means for overlaying the waveform pattern on the prescribed pattern.  
   
     
     
         3 . The device for examining contact state of films according to  claim 1 , wherein 
 said device for examining contact state of films comprises: 
 luminance level calculating means for calculating the average of a luminance level in the image of the prescribed pattern photographed by said photographing means; and  
 luminance level display means for numerically displaying the average of the luminance level calculated by said luminance level calculating means.  
   
     
     
         4 . The device for examining contact state of films according to  claim 1 , wherein 
 the prescribed pattern is a stripe pattern in which a high transparent part having a high light transparent property and a low transparent part having a low light transparent property are linearly and alternately laid in a running direction of the first film and the second film.    
     
     
         5 . The device for examining contact state of films according to  claim 1 , wherein 
 said device for examining contact state of films comprises 
 control means for controlling said photographing means to shift in a width direction of the first film and the second film.  
   
     
     
         6 . A device for examining contact state of films, comprising: 
 photographing means for photographing the image of a prescribed pattern irradiated with a transparent light which is radiated by a light source from the other surface of a first film and goes through the first film and a second film in order, from the other surface side of the second film, under such a condition that one surface having the light scattering property of the second film faces and contacts one surface having the prescribed pattern recorded thereon of the first film;    waveform pattern creating means for creating a waveform pattern based on a luminance level in the image of the prescribed pattern photographed by said photographing means; and    display means for displaying the waveform pattern based on the luminance level.    
     
     
         7 . The device for examining contact state of films according to  claim 6 , wherein 
 said device for examining contact state of films comprises 
 overlaying means for overlaying the image of the prescribed pattern photographed by said photographing means on the waveform pattern.  
   
     
     
         8 . The device for examining contact state of films according to  claim 6 , wherein 
 said device for examining contact state of films comprises 
 luminance level calculating means for calculating the average of a luminance level in the image of the prescribed pattern photographed by said photographing means; and  
 luminance level display means for numerically displaying the average of the luminance level calculated by said luminance level calculating means.  
   
     
     
         9 . The device for examining contact state of films according to  claim 6 , wherein 
 the prescribed pattern is a stripe pattern in which a high transparent part having a high light transparent property and a low transparent part having a low light transparent property are linearly and alternately laid in a running direction of the first film and the second film.    
     
     
         10 . The device for examining contact state of films according to  claim 6 , wherein 
 said device for examining contact state of films comprises 
 control means for controlling said photographing means to shift in a width direction of the first film and the second film.  
   
     
     
         11 . A method of examining contact state of films, comprising: 
 a photographing step of photographing the image of a prescribed pattern irradiated with a transparent light which is radiated by a light source from the other surface side of a first film and goes through the first film and a second film in order, from the other surface side of the second film, under such a condition that one surface having the light scattering property of the second film faces and contacts one surface having the prescribed pattern recorded thereon of the first film; and    a display step of displaying the image of the prescribed pattern photographed by said photographing step.    
     
     
         12 . The method of examining contact state of films according to  claim 11 , wherein 
 said method of examining contact state of films comprises: 
 a waveform pattern creating step of creating a waveform pattern based on a luminance level in the image of the prescribed pattern photographed by said photographing step; and  
 an overlaying means for overlaying the waveform pattern on the prescribed pattern.  
   
     
     
         13 . The method of examining contact state of films according to  claim 11 , wherein 
 said method of examining contact state of films comprises: 
 a luminance level calculating step of calculating the average of a luminance level in the image of the prescribed pattern photographed by said photographing step; and  
 a luminance level display means for numerically displaying the average of the luminance level calculated by said luminance level calculating step.  
   
     
     
         14 . The method of examining contact state of films according to  claim 11 , wherein 
 the prescribed pattern is a stripe pattern in which a high transparent part having a high light transparent property and a low transparent part having a low light transparent property are linearly and alternately laid in a running direction of the first film and the second film.    
     
     
         15 . A method of examining contact state of films, comprising 
 a photographing step of photographing the image of a prescribed pattern irradiated with a transparent light which is radiated by a light source from the other surface side of a first film and goes through the first film and a second film in order, from the other surface side of the second film, under such a condition that one surface having the light scattering property of the second film faces and contacts one surface having the prescribed pattern recorded thereon of the first film;    a waveform pattern creating step of creating a waveform pattern based on a luminance level in the image of the prescribed pattern photographed by said photographing step; and    a display step of displaying the waveform pattern based on the luminance level.    
     
     
         16 . The method of examining contact state of films according to  claim 15 , wherein 
 said method of examining contact state of films comprises 
 an overlaying step of overlaying the image of the prescribed pattern photographed by said photographing step on the waveform pattern.  
   
     
     
         17 . The method of examining contact state of films according to  claim 15 , wherein 
 said method of examining contact state of films comprises 
 a luminance level calculating step of calculating the average of a luminance level in the image of the prescribed pattern photographed by said photographing step; and  
 a luminance level display step of numerically displaying the average of the luminance level calculated by said luminance level calculating step.  
   
     
     
         18 . The method of examining contact state of films according to  claim 15 , wherein 
 the prescribed pattern is a stripe pattern in which a high transparent part having a high light transparent property and a low transparent part having a low light transparent property are linearly and alternately laid in a running direction of the first film and the second film.    
     
     
         19 . A film for examination used in a device for examining contact state of films to examine the contact state of piled films, comprising 
 in the case of examining the contact state using the photographing result obtained by photographing the image irradiated with a transparent light which is radiated by a light source from the film for examination side and goes through the film for examination and a second film in order, under such a condition that said film for examination and the second film are piled in said device for examining contact state of films,    a pattern of a plurality of stripes formed in a running direction of films on one surface of said film for examination which has to face and contact one surface having the light scattering property of the second film.    
     
     
         20 . The film for examination according to  claim 19 , wherein 
 the stripe pattern is a stripe pattern in which a high transparent part having a high light transparent property and a low transparent part having a low light transparent property are alternately, periodically and linearly laid with the same width in the running direction of films.    
     
     
         21 . The film for examination according to  claim 19 , wherein 
 the stripe pattern is a stripe pattern in which a high transparent part having a high light transparent property and a low transparent part having a low light transparent property are alternately, irregularly and linearly laid with different widths in the running direction of films.