Coating formation by reactive deposition
Abstract
Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1 . A method for coating a substrate comprising:
reacting a flowing reactant stream to form a stream of product particles; and depositing at least a portion of the product particles onto a substrate at a deposition rate of at least about 5 g/hr.
2 . The method of claim 1 wherein the deposition rate is at least about 10 g/hr.
3 . The method of claim 1 wherein the deposition rate is from about 25 g/hr to about 5 kg/hr.
4 . The method of claim 1 wherein the reactant stream has a cross section perpendicular to the propagation direction characterized by a major axis and a minor axis, the major axis being at least a factor of two greater than the minor axis.
5 . The method of claim 1 wherein the depositing at least a portion of the product particles comprises moving the substrate relative to the stream of product particles.
6 . The method of claim 1 wherein the reacting of the flow is driven by a light beam.
7 . A method for coating a substrate comprising:
reacting a flowing reactant stream to form a stream of product particles; and depositing a least a portion of the product particles onto a substrate, wherein the deposition of the product particles comprises moving the substrate relative to the stream of product particles at a rate of at least about 0.1 centimeters per second.
8 . The method of claim 7 wherein the deposition of the product particles comprises moving the substrate relative to the stream of product particles at a rate of at least about 0.5 centimeters per second.
9 . The method of claim 7 wherein the deposition of the product particles comprises moving the substrate relative to the stream of product particles at a rate from about 1 centimeters per second to about 30 centimeters per second.
10 . The method of claim 7 wherein reacting the reactant stream is driven by a radiation beam and wherein the reactant stream is elongated in a direction along the propagation direction of the radiation beam to produce a line of particles with the relative motion of the substrate sweeping at least a portion of the line of product particles across the substrate.
11 . The method of claim 10 wherein the radiation beam is generated by a light source.Join the waitlist — get patent alerts
Track US2003228415A1 — get alerts on status changes and closely related new filings.
We store only your email — no account needed. See our privacy policy.