Abrasive, a method of polishing with the abrasive, and a method of washing a polished object

Abstract

An abrasive includes abrasive grains, a solvent, and an additive. MnO 2 , Mn 2 O 3 , Mn 3 O 4 , MnO or a mixture thereof as the abrasive grains, H 2 O 2 as the solvent, and HNO 3 , an organic acid, H 2 O 2 , etc., as the additive are employed. The abrasive is solidified with cooling, etc. The abrasive and the additive can be supplied to a polishing apparatus through separate routes.

What is claimed is:  
     
         1 . An abrasive comprising: 
 abrasive grains selected from the group consisting of MnO, Mn 3 O 4 , and a mixture thereof; and    an additive that comprises NO 3   − .    
     
     
         2 . An abrasive comprising: 
 abrasive grains selected from the group consisting of MnO, Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof; and    an additive that comprises H 2 O 2 .    
     
     
         3 . An abrasive comprising: 
 abrasive grains selected from the group consisting of MnO, MnO 2 , Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof; and    an additive that comprises at least one organic acid selected from the group consisting of gluconic acid, ortho-methylbenzoic acid, citric acid, malonic acid, and acetic acid.    
     
     
         4 . A polishing method of polishing an object with an abrasive that comprises abrasive grains, comprising the step of: 
 mixing an additive with the abrasive,    wherein the abrasive grains are selected from the group consisting of MnO, Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof; and    the additive comprises NO 3   − .    
     
     
         5 . The polishing method as claimed in  claim 4 , wherein the object is selected from the group consisting of Si, W, Al, Cu, Ti, TiN, Cr, Co, Fe, Ni, Nb, Mo, MoO, MO 2 N, Ru, RuO, Pd, Hf, Ta, TaN, WN, Ir and IrO.  
     
     
         6 . A polishing method of polishing an object with an abrasive that comprises abrasive grains, comprising the step of: 
 mixing an additive with the abrasive,    wherein the abrasive grains are selected from the group consisting of MnO, MnO 2 , Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof; and    the additive comprises H 2 O 2 .    
     
     
         7 . The polishing method as claimed in  claim 6 , wherein the object is selected from the group consisting of Si, W, Al, Cu, Ti, TiN, Cr, Co, Fe, Ni, Nb, Mo, MoO, Mo 2 N, Ru, RuO, Pd, Hf, Ta, TaN, WN, Ir and IrO.  
     
     
         8 . A polishing method of polishing an object with an abrasive that comprises abrasive grains, comprising the step of: 
 mixing an additive with the abrasive,    wherein the abrasive grains are selected from the group consisting of MnO, MnO 2 , Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof; and    the additive comprises an organic acid.    
     
     
         9 . The polishing method as claimed in  claim 8 , wherein the organic acid is at least one organic acid selected from the group consisting of gluconic acid, ortho-methylbenzoic acid, citric acid, malonic acid, and acetic acid.  
     
     
         10 . The polishing method as claimed in  claim 8 , wherein the object is selected from the group consisting of Si, W, Al, Cu, Ti, TiN, Cr, Co, Fe, Ni, Nb, Mo, MoO, MO 2 N, Ru, RuO, Pd, Hf, Ta, TaN, WN, Ir and IrO.  
     
     
         11 . A polishing method of polishing an object, comprising the steps of: 
 solidifying an abrasive that comprises abrasive grains selected from the group consisting of MnO, MnO 2 , Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof; and    polishing the object with the solidified abrasive.    
     
     
         12 . The polishing method as claimed in  claim 11 , wherein the step of solidifying the abrasive comprises cooling and coagulating of the abrasive.  
     
     
         13 . The polishing method as claimed in claims  11 , wherein the object is selected from the group consisting of SiO 2 , polysilicon, W, Al, Cu, Ti, TiN, Cr, Co, Fe, Ni, Nb, Mo, MoO, Mo 2 N, Ru, RuO, Pd, Hf, Ta, TaN, WN, Ir and IrO.  
     
     
         14 . The polishing method as claimed in  claim 11 , wherein the abrasive comprises an additive and 
 the additive comprises one of NO 3   − , potassium phthalate, and an organic acid.    
     
     
         15 . The polishing method as claimed in  claim 14 , wherein the abrasive further comprises an additive that comprises one of an inorganic acid, potassium phthalate, an organic acid, and H 2 O 2 .  
     
     
         16 . The polishing method as claimed in  claim 14 , wherein the object is selected from the group consisting of W, Al, Cu, Ti, TiN, Cr, Co, Fe, Ni, Nb, Mo, MoO, MO 2 N, Ru, RuO, Pd, Hf, Ta, TaN, WN, Ir and IrO.  
     
     
         17 . A washing method of washing an object polished with an abrasive that comprises abrasive grains selected from the group consisting of MnO, MnO 2 , Mn 2 O 3 , Mn 3 O 4 , and a mixture thereof, wherein the polished object is washed with a washing liquid that comprises one of an organic acid and a lower alcohol.  
     
     
         18 . The washing method as claimed in  claim 17 , wherein a temperature of the washing liquid is equal to or more than 50° C.