Pattern writing apparatus and pattern writing method

Abstract

A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. Light from the micromirrors of the DMD are directed to irradiation regions ( 61 ) on the substrate, respectively. The irradiation regions ( 61 ) are moved over the substrate with movement of the substrate relative to the head. The DMD is provided within the head so that the direction of arrangement of the irradiation regions ( 61 ) is tilted relative to the main scanning direction, and a center-to-center distance (L 1 ) along the sub-scanning direction between two adjacent irradiation regions ( 61 ) arranged in the main scanning direction is made equal to a pitch (P 1 ) of writing cells ( 620 ) on the substrate with respect to the sub-scanning direction. This allows multiple exposures centered about each of the writing cells ( 620 ), thereby achieving high-speed pattern writing while permitting precise control of the pattern linewidth.

What is claimed is:  
     
         1 . A pattern writing apparatus for writing a pattern on a photosensitive material, comprising: 
 a head applying light to an irradiation region group arrayed in a lattice arrangement;    a scanning mechanism for scanning said irradiation region group over a photosensitive material in a scanning direction which is tilted relative to a direction of arrangement of said irradiation region group, and passing a plurality of irradiation regions over a plurality of writing regions on said photosensitive material; and    a controller controlling an amount of light applied to each of said writing regions on said photosensitive material by exercising individual ON/OFF control of light irradiation of said irradiation region group in synchronization with scanning of said irradiation region group.    
     
     
         2 . The pattern writing apparatus according to  claim 1 , wherein 
 said head comprises: 
 a spatial light modulator having a lattice arrangement of a light modulating element group which spatially modulates reflected light;  
 a light source emitting light applied to said spatial light modulator; and  
 an optical system directing light from said light modulating element group to said irradiation region group, respectively.  
   
     
     
         3 . The pattern writing apparatus according to  claim 2 , wherein 
 each element of said light modulating element group is a micromirror that changes its position.    
     
     
         4 . The pattern writing apparatus according to  claim 1 , wherein 
 irradiation regions in said irradiation region group are arranged at equal pitches in two directions perpendicular to each other.    
     
     
         5 . The pattern writing apparatus according to  claim 1 , wherein 
 a center-to-center distance along a direction perpendicular to said scanning direction between adjacent irradiation regions arranged in a direction which extends approximately along said scanning direction out of two directions of arrangement of said irradiation region group, is equal to a center-to-center distance between adjacent writing regions arranged in said direction perpendicular to said scanning direction.    
     
     
         6 . The pattern writing apparatus according to  claim 1 , wherein 
 said controller performs ON/OFF control of said light irradiation once while said irradiation region group is scanned by a distance that is twice a center-to-center distance between two adjacent writing regions arranged in said scanning direction.    
     
     
         7 . The pattern writing apparatus according to  claim 1 , wherein 
 a pattern is written on a photoresist film on a substrate for a printed circuit board.    
     
     
         8 . The pattern writing apparatus according to  claim 1 , wherein 
 said scanning mechanism continuously moves said irradiation region group.    
     
     
         9 . A pattern writing method for writing a pattern on a photosensitive material, comprising the steps of: 
 applying light to an irradiation region group arrayed in a lattice arrangement and, by scanning said irradiation region group over a photosensitive material in a scanning direction which is tilted relative to a direction of arrangement of said irradiation region group, passing a plurality of irradiation regions over a plurality of writing regions on said photosensitive material; and    controlling an amount of light applied to each of said writing regions on said photosensitive material by exercising individual ON/OFF control of light irradiation of said irradiation region group in synchronization with scanning of said irradiation region group.    
     
     
         10 . The pattern writing method according to  claim 9 , wherein 
 light is applied to said irradiation region group through a spatial light modulator having a lattice arrangement of a light modulating element group which spacially modulates reflected light.    
     
     
         11 . The pattern writing method according to  claim 10 , wherein 
 each element of said light modulating element group is a micromirror that changes its position.    
     
     
         12 . The pattern writing method according to  claim 9 , wherein 
 irradiation regions in said irradiation region group are arranged at equal pitches in two directions perpendicular to each other.    
     
     
         13 . The pattern writing method according to  claim 9 , wherein 
 a center-to-center distance along a direction perpendicular to said scanning direction between adjacent irradiation regions arranged in a direction which extends approximately along said scanning direction out of two directions of arrangement of said irradiation region group, is equal to a center-to-center distance between adjacent writing regions arranged in said direction perpendicular to said scanning direction.    
     
     
         14 . The pattern writing method according to  claim 9 , wherein 
 in said step of controlling an amount of light, ON/OFF control of said light irradiation is performed once while said irradiation region group is scanned by a distance that is twice a center-to-center distance between two adjacent writing regions arranged in said scanning direction.    
     
     
         15 . The pattern writing method according to  claim 9 , wherein 
 a pattern is written on a photoresist film on a substrate for a printed circuit board.    
     
     
         16 . The pattern writing method according to  claim 9 , wherein 
 said irradiation region group moves continuously.