Apparatus and method for supplying cesium using injector

Abstract

An apparatus and method for supplying cesium by using an injector is disclosed in the present invention, which increases vaporization efficiency and stably supplies cesium gas for a long period of time. The apparatus includes a mass flow controller controlling an amount of an externally introduced inert gas, a pre-heater pre-heating the inert gas introduced through a first gas flow tube from the mass flow controller, a cesium storage unit emitting cesium by using a pressure gas supplied through a pressure gas supplying tube, an injector emitting the cesium supplied from the cesium storage unit, and a cesium vaporizer vaporizing the cesium emitted from the injector and emitting the inert gas introduced from the pre-heater through a second gas flow tube along with the cesium gas through a third gas flow tube. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

What is claimed is:  
     
         1 . An apparatus for supplying cesium by using an injector, comprising: 
 a mass flow controller controlling an amount of an externally introduced inert gas;    a pre-heater pre-heating the inert gas introduced through a first gas flow tube from the mass flow controller;    a cesium storage unit emitting cesium by using a pressure gas supplied through a pressure gas supplying tube;    an injector emitting the cesium supplied from the cesium storage unit; and    a cesium vaporizer vaporizing the cesium emitted from the injector and emitting the inert gas introduced from the pre-heater through a second gas flow tube along with the cesium gas through a third gas flow tube.    
     
     
         2 . The apparatus according to  claim 1 , wherein the injector is controlled by externally applied pulse signals.  
     
     
         3 . The apparatus according to  claim 1 , wherein the injector regulates a size of a cesium particle, an amount of cesium, and an area of cesium spray.  
     
     
         4 . The apparatus according to  claim 1 , wherein the inert gas includes one of argon, nitrogen, and helium.  
     
     
         5 . The apparatus according to  claim 1 , wherein the cesium storage unit is filled with liquid cesium.  
     
     
         6 . The apparatus according to  claim 1 , wherein an inside of the cesium storage unit is maintained at a temperature of at least 29° C.  
     
     
         7 . The apparatus according to  claim 1 , wherein the cesium vaporizer is maintained at a temperature ranging from about 200 to 300° C.  
     
     
         8 . The apparatus according to  claim 1 , wherein the pressure gas is formed of an inert gas.  
     
     
         9 . The apparatus according to  claim 8 , wherein the inert gas is formed of nitrogen.  
     
     
         10 . The apparatus according to  claim 1 , further comprising a heater heating the pre-heater, the cesium storage unit, and the cesium vaporizer.  
     
     
         11 . The apparatus according to  claim 1 , further including a plurality of heating wires heating the first, second, and third gas flow tubes.  
     
     
         12 . The apparatus according to  claim 1 , further including a valve installed within both the second and third gas flow tubes in order to control an amount of cesium flowing therein.  
     
     
         13 . The apparatus according to  claim 1 , further including a pressure gas regulator regulating an amount of pressure gas introduced to the cesium storage unit.  
     
     
         14 . The method for supplying cesium by using an injector, comprising: 
 controlling an amount of an externally introduced inert gas;    pre-heating the inert gas;    emitting and vaporizing cesium supplied by a pressure gas; and    emitting the vaporized cesium along with the pre-heated inert gas.    
     
     
         15 . The method according to  claim 14 , wherein the cesium in the emitting and vaporizing cesium supplied by a pressure gas is emitted on a regular basis.  
     
     
         16 . The method according to  claim 14 , wherein an amount of the pressure gas in the emitting and vaporizing cesium supplied by a pressure gas is controlled in order to regulate an amount of cesium to be emitted.