US2003198004A1PendingUtilityA1

Electrostatic chuck

42
Assignee: IBIDEN CO LTDPriority: May 10, 2000Filed: Mar 27, 2003Published: Oct 23, 2003
Est. expiryMay 10, 2020(expired)· nominal 20-yr term from priority
Inventors:Yasuji HiramatsuYasutaka Ito
H10P 72/722H10P 72/0432H10P 72/72H10P 72/0434H05B 3/143H05B 3/265
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Claims

Abstract

One object of the present invention is to provide an electrostatic chuck which allows sufficiently rapid temperature rising/dropping thereof, in case that the diameter of a ceramic substrate is 190 mm or more or especially incase that the diameter of the ceramic substrate is quite large, exceeding 300 mm. The present invention discloses an electrostatic chuck comprising: a ceramic substrate equipped with a temperature controlling means; an electrostatic electrode formed on the ceramic substrate; and a ceramic dielectric film provided on the electrostatic electrode, wherein: the ceramic substrate has a diameter exceeding 190 mm and a thickness of 20 mm or less; and the ceramic dielectric film contains oxygen in an amount of 0.1 to 20 weight %.

Claims

exact text as granted — not AI-modified
1 . An electrostatic chuck comprising: 
 a ceramic substrate equipped with a temperature controlling means;    an electrostatic electrode formed on said ceramic substrate; and    a ceramic dielectric film provided on said electrostatic electrode,    wherein: 
 said ceramic substrate has a diameter exceeding 190 mm and a thickness of 20 mm or less; and  
 said ceramic dielectric film contains oxygen in an amount of 0.1 to 20 weight %.  
   
     
     
         2 . The electrostatic chuck according to  claim 1 , wherein a resistance heating element is used as said temperature controlling means.  
     
     
         3 . An electrostatic chuck comprising: 
 a ceramic substrate equipped with a temperature controlling means;    an electrostatic electrode formed on said ceramic substrate; and    a ceramic dielectric film provided on said electrostatic electrode,    wherein said ceramic substrate has a diameter exceeding 300 mm and a thickness of 20 mm or less.    
     
     
         4 . The electrostatic chuck according to  claim 3 , 
 wherein said ceramic dielectric film contains oxygen in an amount of 0.1 to 20 weight %.    
     
     
         5 . The electrostatic chuck according to  claim 3  or  4 , 
 wherein a resistance heating element is used as said temperature controlling means.  
 
     
     
         6 . The electrostatic chuck according to any of  claims 1  to  5 , 
 wherein the thickness of said ceramic dielectric film is in a range of 50 to 5000 μm.

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